Inventor

Yuji Chiba

Inventor

Isehara, JP

Overview

33→

Patents

1989–2019

Patent span

Physics

Primary field (CPC G)

Patents· 33 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G03Fprimary

G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices22%

B41JTypewriters11%

Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests8%

Y10TTechnical subjects covered by former us classification8%

G03GElectrography7%

H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h107%

H01JElectric discharge tubes or discharge lamps5%

H04NPictorial communication, e.g. television5%

B01JChemical or physical processes, e.g. catalysis or colloid chemistry3%

B29CShaping or joining of plastics3%

PatentTitleYear

10,489,271Multi-processor and multi-processor system for code debugging2019 7,575,103'Elevator supervisory system for managing operating condition data'2009 7,162,233'Elevator call registration system'2007 6,805,088'Air intake system of engine'2004 6,307,582'Ink ribbon cassette which can be used in line type thermal transfer printer'2001 6,224,248'Light-source device and exposure apparatus'2001 6,014,421'Radiation reduction exposure apparatus and method of manufacturing semiconductor device'2000 6,005,910'Holding mechanism, and exposure apparatus using the mechanism'1999 5,999,589'Substrate holding device and exposing apparatus using the same'1999 5,959,304'Semiconductor exposure apparatus'1999 5,930,324'Exposure apparatus and device manufacturing method using the same'1999 5,883,932'Substrate holding device and exposing apparatus using the same'1999 5,854,819'Mask supporting device and correction method therefor, and exposure apparatus and device producing method utilizing the same'1998 5,825,463'Mask and mask supporting mechanism'1998 5,760,802'Recording apparatus and ink cartridge'1998 5,641,264'Substrate conveying device and method of controlling the same'1997 5,552,812'Recording apparatus having an ink mist evacuation system'1996 5,544,213'Mask holding method, mask and mask chuck, exposure apparatus using the mask and the mask chuck, and device production method using the exposure apparatus'1996 5,467,114'Recording apparatus and ink cartridge'1995 5,431,871'Method for manufacturing three-dimensional parts from a fiber-reinforced resin composite'1995 5,356,686'X-ray mask structure'1994 5,290,167'Method of manufacturing three-dimensional parts using sheets of thermoplastic resin high-performance fiber-reinforced composite material and apparatus therefor'1994 5,253,012'Substrate holding apparatus for vertically holding a substrate in an exposure apparatus'1993 5,191,218'Vacuum chuck'1993 5,161,177'Substrate holding apparatus for holding a substrate in an exposure apparatus'1992 5,140,429'Ink-jet recording apparatus with mechanism for automatically regulating a recording head'1992 5,026,239'Mask cassette and mask cassette loading device'1991 4,977,459'Ink-jet recording apparatus with mechanism for automatically regulating a recording head'1990 4,947,190'Ink jet recording apparatus comprising mechanism for conveying sheet-like cleaning medium to a recording region, discharge recovery treatment method employed in the same, and cleaning sheet also employed in the same'1990 4,911,805'Apparatus and process for producing a stable beam of fine particles'1990 4,909,914'Reaction apparatus which introduces one reacting substance within a convergent-divergent nozzle'1990 4,893,137'Recording apparatus and ink cartridge'1990 4,875,810'Apparatus for controlling fine particle flow'1989

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

1989–2001Patents assigned to CANON KK (26)· patent assignee history

1989–1990Based in Atsugi, JP· patent location history

1990–1999Based in Isehara, JP· patent location history

1994–1995Patents assigned to SUMITOMO HEAVY INDUSTRIES (2)· patent assignee history

1994–1995Based in Niihama, JP· patent location history

1998–2001Based in Utsunomiya, JP· patent location history

2001Patents assigned to ALPS ELECTRIC CO LTD (1)· patent assignee history

2004Patents assigned to FUJI HEAVY IND LTD (1)· patent assignee history

2004–2019Based in Tokyo, JP· patent location history

2007–2009Patents assigned to MITSUBISHI ELECTRIC CORP (2)· patent assignee history

Inventor activity

Assignee and location history derived from the patent record.

Assignees

Assignee	Patents	Span
CANON KK	26	1989–2001
MITSUBISHI ELECTRIC CORP	2	2007–2009
SUMITOMO HEAVY INDUSTRIES	2	1994–1995
ALPS ELECTRIC CO LTD	1	2001
FUJI HEAVY IND LTD	1	2004

Locations

Location	Patents	Span
Isehara, JP	17	1990–1999
Utsunomiya, JP	6	1998–2001
Tokyo, JP	4	2004–2019
Atsugi, JP	3	1989–1990
Niihama, JP	2	1994–1995