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Inventor

Yohko Komatsu

Inventor
Kanagawa, JP

Overview

3→
Patents
2018
Patent span
Performing operations
Primary field (CPC B)

Patents· 3 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices20%
B05DProcesses for applying fluent materials to surfaces, in general10%
B29CShaping or joining of plastics10%
B29LIndexing scheme associated with subclass b29c, relating to particular articles10%
B82YSpecific uses or applications of nanostructures10%
C23FNon-mechanical removal of metallic material from surface10%
H01LSemiconductor devices10%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1010%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests10%
PatentTitleYear
10,118,317Template and pattern formation method201810,022,748Stencil mask, stencil mask manufacturing method, and imprinting method20189,885,118'Template forming method, template, and template base material'2018

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2018Patents assigned to TOSHIBA MEMORY CORP (3)· patent assignee history
2018Based in Kanagawa, JP· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
TOSHIBA MEMORY CORP32018
Locations
LocationPatentsSpan
Kanagawa, JP32018