Inventor
Evgeni GUREVICH
Inventor
IL
Overview
Patents· 6 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices30%
G06FElectric digital data processing15%
G06TImage data processing or generation, in general15%
G01NInvestigating or analysing materials by determining their chemical or physical properties10%
G01BMeasuring length, thickness or similar linear dimensions5%
G01CMeasuring distances, levels or bearings5%
G02BOptical elements, systems or apparatus5%
H01LSemiconductor devices5%
H04NPictorial communication, e.g. television5%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h105%
PatentTitleYear
12,105,433Imaging overlay targets using moire elements and rotational symmetry arrangements202412,013,634Reduction or elimination of pattern placement error in metrology measurements202411,862,522Accuracy improvements in optical metrology202411,537,043Reduction or elimination of pattern placement error in metrology measurements202211,256,177Imaging overlay targets using Moire elements and rotational symmetry arrangements202211,164,307Misregistration metrology by using fringe Moire and optical Moire effects2021Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2021–2024Patents assigned to KLA CORP (3)· patent assignee history
2021–2024Based in IL· patent location history
2022–2024Patents assigned to KLA TENCOR CORP (3)· patent assignee history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| KLA CORP | 3 | 2021–2024 |
| KLA TENCOR CORP | 3 | 2022–2024 |
Locations
| Location | Patents | Span |
|---|---|---|
| IL | 6 | 2021–2024 |