Inventor
MASAKI OHASHI
Inventor
JP
Overview
Patents· 41 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices33%
C07CAcyclic or carbocyclic compounds18%
C08FMacromolecular compounds obtained by reactions only involving carbon-to-carbon unsaturated bonds18%
C07DHeterocyclic compounds11%
C09DCoating compositions, e.g. paints, varnishes or lacquers7%
C08LCompositions of macromolecular compounds6%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h102%
Y02EReduction of greenhouse gas [ghg] emissions, related to energy generation, transmission or distribution2%
C08GMacromolecular compounds obtained otherwise than by reactions only involving unsaturated carbon-to-carbon bonds2%
C08KUse of inorganic or non-macromolecular organic substances as compounding ingredients1%
PatentTitleYear
12,535,733Molecular resist composition and patterning process202612,523,932Resist composition and pattern forming process202612,275,693Onium salt, chemically amplified resist composition and patterning process202512,174,536Resist composition and pattern forming process202412,164,227Chemically amplified negative resist composition and resist pattern forming process202412,164,231Chemically amplified positive resist composition and resist pattern forming process202412,072,627Resist composition and patterning process202412,050,402Resist composition and patterning process202411,953,827Molecular resist composition and patterning process202411,940,728Molecular resist composition and patterning process202411,822,239Resist composition and patterning process202311,774,853Resist composition and patterning process202311,709,872Computer-readable recording medium storing response processing program, response processing method, and information processing apparatus202311,693,314Resist composition and patterning process202311,687,000Sulfonium compound, chemically amplified resist composition, and patterning process202311,635,690Positive resist composition and patterning process202311,604,411Resist composition and patterning process202311,579,526Resist composition and patterning process202311,560,355Onium salt, chemically amplified resist composition, and patterning process202311,506,977Positive resist composition and patterning process202211,460,773Resist composition and patterning process202211,460,772Positive resist composition and patterning process202211,448,961Iodonium salt, resist composition, and pattern forming process202211,448,962Resist composition and patterning process202211,435,665Resist composition and patterning process202211,429,023Onium salt, negative resist composition, and resist pattern forming process202211,415,887Resist composition and patterning process202211,409,194Resist composition and patterning process202211,392,034Resist composition and patterning process202211,385,544Composition for forming silicon-containing resist underlayer film and patterning process202211,340,527Resist composition and patterning process202211,281,101Resist composition and patterning process202211,269,253Resist composition and patterning process202211,269,251Resist composition and patterning process202211,262,653Sulfonium salt, polymer, resist composition, and patterning process202211,215,926Sulfonium compound, resist composition, and patterning process202211,204,553Chemically amplified resist composition and patterning process202111,187,980Resist composition and patterning process202111,181,823Resist composition and patterning process202111,175,580Resist composition and patterning process202111,163,232Resist composition, patterning process, and barium salt2021Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2021–2026Patents assigned to SHINETSU CHEMICAL CO (40)· patent assignee history
2021–2026Based in JP· patent location history
2023Patents assigned to FUJITSU LTD (1)· patent assignee history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| SHINETSU CHEMICAL CO | 40 | 2021–2026 |
| FUJITSU LTD | 1 | 2023 |
Locations
| Location | Patents | Span |
|---|---|---|
| JP | 41 | 2021–2026 |