Inventor
Peter Trefonas, III
Inventor
Medway, MA, US
Overview
Patents· 117 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices16%
H01LSemiconductor devices9%
C09DCoating compositions, e.g. paints, varnishes or lacquers8%
C08FMacromolecular compounds obtained by reactions only involving carbon-to-carbon unsaturated bonds7%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h107%
C08LCompositions of macromolecular compounds6%
C08GMacromolecular compounds obtained otherwise than by reactions only involving unsaturated carbon-to-carbon bonds6%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests6%
H10KOrganic electric solid-state devices3%
B81CProcesses or apparatus specially adapted for the manufacture or treatment of microstructural devices or systems3%
PatentTitleYear
11,121,190Optoelectronic device and methods of use202111,021,630Copolymer formulation for directed self assembly, methods of manufacture thereof and articles comprising the same202110,949,026Optoelectronic device and methods of use202110,868,253Process for making an organic charge transporting film202010,818,860Quantum dot light emitting devices202010,794,866Acoustic wave sensors and methods of sensing a gas-phase analyte202010,510,924Multi-heterojunction nanoparticles, methods of manufacture thereof and articles comprising the same201910,454,036Polymeric charge transfer layer and organic electronic device containing the same201910,351,727Copolymer formulation for directed self-assembly, methods of manufacture thereof and articles comprising the same201910,340,144Doping of a substrate via a dopant containing polymer film201910,297,755Oxygen substituted benzoclobutenes derived compositions for electronic devices201910,294,359Copolymer formulation for directed self assembly, methods of manufacture thereof and articles comprising the same201910,287,455Methods for manufacturing block copolymers and articles manufactured therefrom201910,256,410Compositions comprising oxygen substituted benzocyclobutenes and dienophiles, and electronic devices containing the same201910,228,619Photopatterned growth of electronically active brush polymers for light emitting diode displays201910,211,400Photopatterned growth of electronically active brush polymers for light emitting diode displays201910,191,371Underlayer composition and method of imaging underlayer201910,167,411Neutral layer polymers, methods of manufacture thereof and articles comprising the same201910,078,263Underlayer composition and method of imaging underlayer composition201810,078,261Self-assembled structures, method of manufacture thereof and articles comprising the same201810,042,255Block copolymers and pattern treatment compositions and methods201810,011,713Copolymer formulation for directed self assembly, methods of manufacture thereof and articles comprising the same20189,972,792Electron transport layer and film having improved thermal stability20189,958,780Coating compositions for photoresists20189,957,339Copolymer and associated layered article, and device-forming method20189,927,556'Nanostructure material methods and devices'20189,840,637'Copolymer formulation for directed self-assembly, methods of manufacture thereof and articles comprising the same'20179,828,518Copolymer formulations, methods of manufacture thereof and articles comprising the same20179,815,930'Block copolymer and associated photoresist composition and method of forming an electronic device'20179,809,672'Aromatic resins for underlayers'20179,802,400'Orientation control layer formed on a free top surface of a first block copolymer from a mixture of first and second block copolymers'20179,793,485'Benzocyclobutenes derived compositions, and electronic devices containing the same'20179,772,554'Copolymer formulation for directed self-assembly, methods of manufacture thereof and articles comprising the same'20179,765,214'Copolymer formulation for directed self-assembly, methods of manufacture thereof and articles comprising the same'20179,738,814'Method of controlling block copolymer characteristics and articles manufactured therefrom'20179,735,023'Methods for manufacturing block copolymer compositions and articles manufactured therefrom'20179,696,624'Nanoparticle-polymer resists'20179,663,682'Methods for manufacturing block copolymers and articles manufactured therefrom'20179,576,799'Doping of a substrate via a dopant containing polymer film'20179,562,169'Metal hardmask compositions'20179,540,476'Aromatic resins for underlayers'20179,508,549'Methods of forming electronic devices including filling porous features with a polymer'20169,490,117'Directed self-assembly pattern formation methods and compositions'20169,478,713'Nanostructure material methods and devices'20169,464,224'Transformative wavelength conversion medium'20169,447,220'Self-assembled structures, method of manufacture thereof and articles comprising the same'20169,440,899'Purification method'20169,437,431'Electronic device manufacture'20169,418,848'Methods of forming patterns with a mask formed utilizing a brush layer'20169,405,189'Self-assembled structures, method of manufacture thereof and articles comprising the same'20169,394,411'Methods for annealing block copolymers and articles manufactured therefrom'20169,382,444'Neutral layer polymers, methods of manufacture thereof and articles comprising the same'20169,382,472'Transformative wavelength conversion medium'20169,295,153'Method of manufacturing a patterned transparent conductor'20169,223,214'Self-assembled structures, method of manufacture thereof and articles comprising the same'20159,184,058'Methods of forming patterns by using a brush layer and masks'20159,171,720'Hardmask surface treatment'20159,148,969'Method of manufacturing high aspect ratio silver nanowires'20159,136,123'Hardmask surface treatment'20159,127,113'Polystyrene-polyacrylate block copolymers, methods of manufacture thereof and articles comprising the same'20159,123,638'Multi-heterojunction nanoparticles, methods of manufacture thereof and articles comprising the same'20159,102,901'Methods and compositions for removal of metal hardmasks'20159,076,719'Doping of a substrate via a dopant containing polymer film'20159,070,548'Metal hardmask compositions'20159,066,425'Method of manufacturing a patterned transparent conductor'20159,040,114'Method of manufacturing silver miniwire films'20159,012,545'Composition and method for preparing pattern on a substrate'20158,961,918'Thermal annealing process'20158,937,294'Multi-heterojunction nanoparticles, methods of manufacture thereof and articles comprising the same'20158,927,439'Organoaluminum materials for forming aluminum oxide layer from coating composition that contains organic solvent'20158,927,681'Coating composition for use with an overcoated photoresist'20158,822,615'Block copolymer composition and methods relating thereto'20148,821,738'Thermal annealing process'20148,822,130'Self-assembled structures, method of manufacture thereof and articles comprising the same'20148,822,124'Underlayer composition and method of imaging underlayer composition'20148,822,619'Directed self assembly copolymer composition and related methods'20148,822,616'Block copolymer formulation and methods relating thereto'20148,822,133'Underlayer composition and method of imaging underlayer'20148,821,739'High temperature thermal annealing process'20148,795,774'Hardmask'20148,710,150'Blended block copolymer composition'20148,697,810'Block copolymer and methods relating thereto'20147,776,506'Coating compositions for photoresists'20107,582,585'Coating compositions'20097,582,360'Coating compositions for use with an overcoated photoresist'20097,326,518'Photoresist compositions'20087,297,616'Methods, photoresists and substrates for ion-implant lithography'20077,202,009'Polymers and photoresist compositions for short wavelength imaging'20077,163,751'Coating compositions for use with an overcoated photoresist'20077,118,847'Polymer and photoresist compositions'20067,029,821'Photoresist and organic antireflective coating compositions'20067,026,101'Antireflective coating compositions'20066,907,432'Method and system for recycling materials'20056,887,648'Antireflective coating compositions'20056,852,421'Coating compositions for use with an overcoated photoresist'20056,852,466'Photoresist compositions particularly suitable for short wavelength imaging'20056,767,689'Antireflective coating compositions'20046,749,765'Aperture fill'20046,740,467'Photoresist compositions comprising blends of ionic and non-ionic photoacid generators'20046,602,652'Antireflective coating compositions and exposure methods under 200 nm'20036,599,677'Polymer and photoresist compositions'20036,461,717'Aperture fill'20026,410,209'Methods utilizing antireflective coating compositions with exposure under 200 nm'20026,406,828'Polymer and photoresist compositions'20026,379,861'Polymers and photoresist compositions comprising same'20026,280,911'Photoresist compositions comprising blends of ionic and non-ionic photoacid generators'20016,136,501'Polymers and photoresist compositions comprising same'20006,110,641'Radiation sensitive composition containing novel dye'20005,866,299'Negative photoresist composition'19995,723,254'Photoresist with photoactive compound mixtures'19985,589,553'Esterification product of aromatic novolak resin with quinone diazide sulfonyl group'19965,529,880'Photoresist with a mixture of a photosensitive esterified resin and an o-naphthoquinone diazide compound'19965,350,714'Point-of-use purification'19945,178,986'Positive photoresist composition with naphthoquinonediazidesulfonate of oligomeric phenol'19935,164,279'Positive dye photoresist compositions with 4,6-bis(azophenyl)resorcinol'19925,128,230'Quinone diazide containing photoresist composition utilizing mixed solvent of ethyl lactate, anisole and amyl acetate'19924,983,492'Positive dye photoresist compositions with 2,4-bis(phenylazo)resorcinol'1991Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
1991–1993Based in St. Louis, MO, US· patent location history
1992–2021Based in Medway, MA, US· patent location history
1996–2007Patents assigned to SHIPLEY CO LLC (24)· patent assignee history
2006–2021Patents assigned to ROHM & HAAS ELECT MAT (86)· patent assignee history
2014–2021Patents assigned to DOW GLOBAL TECHNOLOGIES LLC (53)· patent assignee history
2014–2015Patents assigned to TREFONAS PETER (10)· patent assignee history
2015–2019Patents assigned to UNIV CALIFORNIA (9)· patent assignee history
2016–2021Based in Marlborough, MA, US· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| ROHM & HAAS ELECT MAT | 86 | 2006–2021 |
| DOW GLOBAL TECHNOLOGIES LLC | 53 | 2014–2021 |
| SHIPLEY CO LLC | 24 | 1996–2007 |
| TREFONAS PETERself | 10 | 2014–2015 |
| UNIV CALIFORNIA | 9 | 2015–2019 |
Locations
| Location | Patents | Span |
|---|---|---|
| Medway, Massachusetts, US | 109 | 1992–2021 |
| Marlborough, Massachusetts, US | 5 | 2016–2021 |
| St. Louis, MO, US | 3 | 1991–1993 |