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Inventor

Toshiro Ishiyama

Inventor
Tokyo, JP

Overview

9→
Patents
1994–2006
Patent span
Physics
Primary field (CPC G)

Patents· 9 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G02Bprimary
G02BOptical elements, systems or apparatus53%
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices40%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h107%
PatentTitleYear
7,154,585'Projection optical system, exposure apparatus, and device production method'20065,771,125'Catadioptric system for photolithography'19985,694,241'Catadioptric reduction projection optical system and exposure apparatus employing the same'19975,668,673'Catadioptric reduction projection optical system'19975,592,329'Catadioptric optical system'19975,477,388'Inverse telescopic wide angle lens'19955,434,425'Optical position detecting apparatus'19955,321,553'Zoom lens'19945,321,554'Inverse telescopic wide angle lens'1994

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

1994–2006Patents assigned to NIKON CORP (9)· patent assignee history
1994–1997Based in Tokyo, JP· patent location history
1997–1998Based in Kawasaki, JP· patent location history
2006Based in Saitama, JP· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
NIKON CORP91994–2006
Locations
LocationPatentsSpan
Tokyo, JP51994–1997
Kawasaki, JP31997–1998
Saitama, JP12006