Inventor
Christopher K. Magg
Inventor
Essex Junction, VT, US
Overview
Patents· 8 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices67%
G01NInvestigating or analysing materials by determining their chemical or physical properties17%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1017%
PatentTitleYear
7,742,632'Alternating phase shift mask inspection using biased inspection data'20107,619,730'Mask inspection DNIR replacement based on location of tri-tone level database images—2P shapes'20097,494,748'Method for correction of defects in lithography masks'20097,443,497'Mask inspection DNIR placement based on location of tri-tone level database images (2P shapes)'20087,168,224'Method of making a packaged radiation sensitive resist film-coated workpiece'20076,989,219'Hardmask/barrier layer for dry etching chrome films and improving post develop resist profiles on photomasks'20066,811,959'Hardmask/barrier layer for dry etching chrome films and improving post develop resist profiles on photomasks'20046,543,617'Packaged radiation sensitive coated workpiece process for making and method of storing same'2003Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2003–2010Patents assigned to IBM (8)· patent assignee history
2003–2010Based in Essex Junction, VT, US· patent location history
2008–2009Based in Jericho, VT, US· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| IBM | 8 | 2003–2010 |
Locations
| Location | Patents | Span |
|---|---|---|
| Essex Junction, VT, US | 5 | 2003–2010 |
| Jericho, VT, US | 3 | 2008–2009 |