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Inventor

Yusuke Fuji

Inventor
Ibaraki, JP

Overview

16→
Patents
2007–2020
Patent span
Physics
Primary field (CPC G)

Patents· 16 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices20%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests16%
C08FMacromolecular compounds obtained by reactions only involving carbon-to-carbon unsaturated bonds9%
B29CShaping or joining of plastics5%
B29KIndexing scheme associated with subclasses b29b, b29c or b29d, relating to moulding materials or to materials for moulds, reinforcements, fillers or preformed parts, e.g. inserts5%
C07DHeterocyclic compounds5%
G01LMeasuring force, stress, torque, work, mechanical power, mechanical efficiency, or fluid pressure5%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h105%
Y10TTechnical subjects covered by former us classification5%
B01DSeparation2%
PatentTitleYear
10,801,908Diaphragm suppressing pressure sensor202010,766,992Resin and resist composition202010,578,506Pressure sensor that measures the pressure within a combustion chamber of an internal combustion engine202010,183,893Compact drying method20199,809,014'Resin joined body and method for manufacturing same'20179,735,552'Spark plug'20179,051,405'Resin and resist composition'20158,357,015'Metal-resin compound member'20138,062,830'Chemically amplified positive resist composition'20118,062,829'Chemically amplified resist composition and chemically amplified resist composition for immersion lithography'20118,057,983'Chemically amplified positive resist composition'20118,048,612'Polymer and chemically amplified resist composition comprising the same'20117,981,985'Polymer and chemically amplified resist composition comprising the same'20117,794,914'Chemically amplified positive resist composition'20107,572,570'Chemically amplified resist composition'20097,175,963'Chemical amplification type positive resist composition and a resin therefor'2007

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2007–2020Patents assigned to SUMITOMO CHEMICAL CO (10)· patent assignee history
2007–2020Based in Ibaraki, JP· patent location history
2011–2015Patents assigned to FUJI YUSUKE (5)· patent assignee history
2011Patents assigned to MIYAGAWA TAKAYUKI (3)· patent assignee history
2011Patents assigned to ANDO NOBUO (2)· patent assignee history
2013–2020Patents assigned to NGK SPARK PLUG CO (5)· patent assignee history
2013Based in Aichi, JP· patent location history
2017Based in Iwakura, JP· patent location history
2019–2020Based in Nagoya, JP· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
SUMITOMO CHEMICAL CO102007–2020
FUJI YUSUKEself52011–2015
NGK SPARK PLUG CO52013–2020
MIYAGAWA TAKAYUKI32011
ANDO NOBUO22011
Locations
LocationPatentsSpan
Ibaraki, JP102007–2020
Nagoya, JP32019–2020
Iwakura, JP22017
Aichi, JP12013