Inventor
WATARU SHIBAYAMA
Inventor
JP
Overview
Patents· 15 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices22%
C08GMacromolecular compounds obtained otherwise than by reactions only involving unsaturated carbon-to-carbon bonds21%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1018%
C09DCoating compositions, e.g. paints, varnishes or lacquers16%
H01LSemiconductor devices13%
C08KUse of inorganic or non-macromolecular organic substances as compounding ingredients4%
C07FAcyclic, carbocyclic or heterocyclic compounds containing elements other than carbon, hydrogen, halogen, oxygen, nitrogen, sulfur, selenium or tellurium3%
B05DProcesses for applying fluent materials to surfaces, in general1%
C08LCompositions of macromolecular compounds1%
PatentTitleYear
12,585,188Composition for forming resist underlying film202612,517,432Substrate treating composition and method for fabricating a semiconductor device using the same202612,493,243Film-forming composition202512,372,875Composition for resist pattern metallization process202512,248,251Silicon-containing resist underlayer film-forming composition including organic group having ammonium group202512,227,621Film-forming composition202512,084,592Coating composition for pattern inversion202411,966,164Semiconductor device production method employing silicon-containing resist underlayer film-forming composition including organic group having ammonium group202411,815,815Composition for forming silicon-containing resist underlayer film removable by wet process202311,561,472Radiation sensitive composition202311,531,269Method for producing resist pattern coating composition with use of solvent replacement method202211,392,037Resist underlayer film forming composition containing silicone having cyclic amino group202211,281,104Alkaline developer soluable silicon-containing resist underlayer film-forming composition202211,215,927Substrate treating composition and method for fabricating a semiconductor device using the same202211,175,583Silicon-containing resist underlayer film-forming composition having phenyl group-containing chromophore2021Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2021–2023Patents assigned to NISSAN CHEMICAL IND LTD (4)· patent assignee history
2021–2026Based in JP· patent location history
2022–2026Patents assigned to NISSAN CHEMICAL CORP (11)· patent assignee history
2022–2026Patents assigned to SAMSUNG ELECTRONICS CO LTD (2)· patent assignee history
2022Patents assigned to KANNO YUTA (1)· patent assignee history
2022Patents assigned to NAKAJIMA MAKOTO (1)· patent assignee history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| NISSAN CHEMICAL CORP | 11 | 2022–2026 |
| NISSAN CHEMICAL IND LTD | 4 | 2021–2023 |
| SAMSUNG ELECTRONICS CO LTD | 2 | 2022–2026 |
| KANNO YUTA | 1 | 2022 |
| NAKAJIMA MAKOTO | 1 | 2022 |
Locations
| Location | Patents | Span |
|---|---|---|
| JP | 15 | 2021–2026 |