Inventor

Masaaki Yoshida

Inventor

Kanagawa, JP

Overview

1976–2021

Patent span

Physics

Primary field (CPC G)

Patents· 75 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G03Fprimary

G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices11%

Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests7%

H10DInorganic electric semiconductor devices7%

H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h105%

C03CChemical composition of glasses, glazes or vitreous enamels4%

C07CAcyclic or carbocyclic compounds4%

H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h104%

H10BElectronic memory devices3%

Y10TTechnical subjects covered by former us classification3%

B29DProducing particular articles from plastics or from substances in a plastic state2%

PatentTitleYear

11,007,896Storage apparatus, control apparatus, and moving body2021 10,227,066Operation mode control device, method for controlling operation mode, movable body, output control device, charge discharge control device, and electronic device2019 10,046,652Charge control apparatus, movable body, and charge control method2018 9,927,703'Layered polymer structures and methods'2018 9,780,589'Electric power control system'2017 9,620,962'Power supply device and electric apparatus'2017 8,741,538'Polymer compound, photoresist composition containing such polymer compound, and method for forming resist pattern'2014 8,716,501'Method for producing oxygen-containing compound'2014 8,623,131'Surface treatment agent and surface treatment method'2014 8,410,296'Surface treatment agent and surface treatment method'2013 8,389,642'Method of treating polymer with carbon-carbon bond framework and product obtained by the treating method'2013 8,243,350'Apparatus with image reading units arranged in zigzag manner for obtaining digital data to generate one-line image data'2012 8,198,004'Resist composition'2012 8,067,819'Semiconductor wafer including semiconductor chips divided by scribe line and process-monitor electrode pads formed on scribe line'2011 8,054,510'Document reading method, document reader, image forming device, and image scanner'2011 8,003,476'Semiconductor device having a plurality of kinds of wells and manufacturing method thereof'2011 7,982,531'Reference voltage generating circuit and power supply device using the same'2011 7,924,400'Method for measuring liquid immersion lithography soluble fraction in organic film'2011 7,879,529'Material for formation of resist protection film and method of forming resist pattern therewith'2011 7,846,637'Material for forming resist protective film for use in liquid immersion lithography process and method for forming resist pattern using the protective film'2010 7,700,259'Polymer compound, photoresist composition containing such polymer compound, and method for forming resist pattern'2010 7,700,257'Photoresist composition and resist pattern formation method by the use thereof'2010 7,592,122'Photoresist composition, and low-molecular compound and high-molecular compound for the photoresist composition'2009 7,579,645'Semiconductor device having non-volatile memory cell'2009 7,541,138'Resist composition'2009 7,527,909'Resist composition'2009 7,501,220'Resist composition'2009 7,405,460'Semiconductor device having a plurality of kinds of wells and manufacturing method thereof'2008 7,371,510'Material for forming resist protecting film for use in liquid immersion lithography process, composite film, and method for forming resist pattern'2008 7,335,557'Semiconductor device of non-volatile memory'2008 7,326,512'Polymer compound, resist composition and dissolution inhibitor agent containing the polymer compound'2008 7,314,797'Semiconductor device and its manufacturing method'2008 7,264,918'Resist composition for liquid immersion exposure process and method of forming resist pattern therewith'2007 7,217,384'Device and method for runner-less molding of thermosetting resin and rubber'2007 6,952,035'Semiconductor device of non-volatile memory'2005 6,949,790'Semiconductor device and its manufacturing method'2005 6,841,709'Method of cutting polymer chains and method for producing chemical raw materials'2005 6,750,372'Process for producing aryl ether'2004 6,696,357'Method for manufacturing semiconductor integrated circuit devices using a conductive layer to prevent peeling between a bonding pad and an underlying insulating film'2004 6,426,740'Visual-axis entry transmission apparatus and method therefor'2002 6,336,054'Interlock apparatus for a transfer machine'2002 6,288,735'Color image recording method, color image recording apparatus, and color image recording controlling method'2001 6,261,378'Substrate cleaning unit and cleaning method'2001 6,161,932'Visual axis input and decision transfer device and method'2000 6,087,632'Heat processing device with hot plate and associated reflector'2000 6,005,596'Method for recording color image, apparatus for recording color image, and method for controlling recording of color image'1999 5,998,766'Apparatus and method for cleaning substrate surface by use of Ozone'1999 5,963,449'Interlock apparatus for a transfer machine'1999 5,820,726'Apparatus for supplying sheet materials'1998 5,698,479'Glass fiber for non-woven fabric and a method of producing a laminate'1997 5,680,158'Communication apparatus including a plurality of light sources arranged in columns and lines corresponding to columns and lines of a plurality of key switches'1997 5,667,610'Method of supplying sheet materials'1997 5,584,965'Method of producing a laminate of glass fiber non-woven fabric base material'1996 5,519,714'Testable scan path circuit operable with multi-phase clock'1996 5,514,895'Semiconductor integrated circuit device'1996 5,410,173'Semiconductor integrated circuit device'1995 5,255,728'Automatic spew trimming method and apparatus used therefor'1993 5,041,847'Thermal head'1991 D0318679'Electronic flash'1991 4,984,198'Liquid crystal electrooptic memory device'1991 4,974,007'Photographing device having plural range finding elements and plural photometric elements'1990 4,713,107'Apparatus for producing porous preforms for optical fibers'1987 4,672,614'Semiconductor memory device with parallel addressing and data-correcting functions'1987 4,656,466'Electro-optic display device'1987 4,655,545'Glass fiber for optical transmission'1987 4,610,525'Electronic flash device'1986 4,539,219'Method for coating optical transmission glass fibers'1985 4,512,644'Flash device'1985 4,512,281'Method for coating optical transmission glass fibers'1985 4,465,353'Electronic flash device'1984 4,406,680'Process for producing high-purity silica glass'1983 4,344,669'Coated glass fibers for optical transmission'1982 4,334,733'Coated glass fibers for optical transmission'1982 4,208,252'Apparatus for treatment of rubber and plastic wastes'1980 3,984,288'Method for treatment of rubber and plastic wastes'1976

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

1983–2021Based in Kanagawa, JP· patent location history

1984–2002Patents assigned to CANON KK (9)· patent assignee history

1984–2002Based in Tokyo, JP· patent location history

1991–2009Patents assigned to RICOH KK (7)· patent assignee history

1999–2012Based in Chiba, JP· patent location history

2005–2011Based in Hyogo, JP· patent location history

2007–2014Patents assigned to TOKYO OHKA KOGYO CO LTD (16)· patent assignee history

2008–2014Based in Kawasaki, JP· patent location history

2011–2021Patents assigned to YOSHIDA MASAAKI (13)· patent assignee history

2011–2021Patents assigned to RICOH CO LTD (8)· patent assignee history

Inventor activity

Assignee and location history derived from the patent record.

Assignees

Assignee	Patents	Span
TOKYO OHKA KOGYO CO LTD	16	2007–2014
YOSHIDA MASAAKIself	13	2011–2021
CANON KK	9	1984–2002
RICOH CO LTD	8	2011–2021
RICOH KK	7	1991–2009

Locations

Location	Patents	Span
Kanagawa, JP	13	1983–2021
Kawasaki, JP	13	2008–2014
Tokyo, JP	13	1984–2002
Hyogo, JP	9	2005–2011
Chiba, JP	4	1999–2012