Inventor

Theodorus Marinus Modderman

Inventor
Nuenen, NL

Overview

38→
Patents
1994–2020
Patent span
Physics
Primary field (CPC G)

Patents· 38 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices95%
G01NInvestigating or analysing materials by determining their chemical or physical properties3%
G03BApparatus or arrangements for taking photographs or for projecting or viewing them3%
PatentTitleYear
10,620,545Lithographic apparatus and device manufacturing method202010,324,384Lithographic apparatus and a method of manufacturing a lithographic apparatus201910,248,035Lithographic apparatus201910,222,706Lithographic apparatus and device manufacturing method201910,001,712Immersion lithographic apparatus and device manufacturing method20189,964,858Lithographic apparatus and device manufacturing method20189,835,960Lithographic apparatus20179,417,535'Lithographic apparatus'20169,329,494'Lithographic apparatus'20169,195,153'Lithographic apparatus and device manufacturing method'20159,116,443'Lithographic apparatus and device manufacturing method'20159,110,389'Lithographic apparatus and device manufacturing method'20159,091,940'Lithographic apparatus and method involving a fluid inlet and a fluid outlet'20158,797,503'Lithographic apparatus and device manufacturing method with a liquid inlet above an aperture of a liquid confinement structure'20148,462,312'Lithographic apparatus and device manufacturing method'20138,363,208'Lithographic apparatus and device manufacturing method'20138,344,341'Lithographic apparatus and device manufacturing method'20138,233,137'Lithographic apparatus and device manufacturing method'20128,208,120'Lithographic apparatus and device manufacturing method'20127,982,850'Immersion lithographic apparatus and device manufacturing method with gas supply'20117,835,017'Lithographic apparatus, method of exposing a substrate, method of measurement, device manufacturing method, and device manufactured thereby'20107,795,603'Lithographic apparatus and device manufacturing method'20107,684,008'Lithographic apparatus and device manufacturing method'20107,528,931'Lithographic apparatus and device manufacturing method'20097,482,611'Lithographic apparatus and device manufacturing method'20097,388,648'Lithographic projection apparatus'20087,372,541'Lithographic apparatus and device manufacturing method'20087,317,504'Lithographic apparatus and device manufacturing method'20087,206,058'Off-axis levelling in lithographic projection apparatus'20077,202,938'Off-axis levelling in lithographic projection apparatus'20077,193,232'Lithographic apparatus and device manufacturing method with substrate measurement not through liquid'20077,081,943'Lithographic apparatus and device manufacturing method'20067,078,715'Lithographic apparatus and apparatus adjustment method'20067,019,815'Off-axis leveling in lithographic projection apparatus'20066,952,253'Lithographic apparatus and device manufacturing method'20056,882,405'Off-axis levelling in lithographic projection apparatus'20056,674,510'Off-axis levelling in lithographic projection apparatus'20045,303,590'Method of and an apparatus for frequency selective ultrasonic inspection of multi-layered structures'1994

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

1994Based in Heemstede, NL· patent location history
2004–2020Patents assigned to ASML NETHERLANDS BV (37)· patent assignee history
2004–2020Based in Nuenen, NL· patent location history
2012–2015Patents assigned to MODDERMAN THEODORUS MARINUS (9)· patent assignee history
2012–2015Patents assigned to DE SMIT JOANNES THEODOOR (6)· patent assignee history
2012–2015Patents assigned to LOF JOERI (4)· patent assignee history
2012–2015Patents assigned to LOOPSTRA ERIK ROELOF (4)· patent assignee history
2012Based in Neunen, NL· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
ASML NETHERLANDS BV372004–2020
MODDERMAN THEODORUS MARINUSself92012–2015
DE SMIT JOANNES THEODOOR62012–2015
LOF JOERI42012–2015
LOOPSTRA ERIK ROELOF42012–2015
Locations
LocationPatentsSpan
Nuenen, NL362004–2020
Neunen, NL12012
Heemstede, NL11994