Inventor
THOMAS THEEUWES
Inventor
NL
Overview
Patents· 17 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices30%
H01LSemiconductor devices14%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1014%
G01BMeasuring length, thickness or similar linear dimensions11%
G01NInvestigating or analysing materials by determining their chemical or physical properties11%
G06FElectric digital data processing11%
G06TImage data processing or generation, in general5%
G05BControl or regulating systems in general2%
G06KGraphical data reading2%
G21KHandling of particles or ionising radiation not otherwise provided for2%
PatentTitleYear
12,510,828Method for controlling a manufacturing process and associated apparatuses202512,468,235Method and apparatus to determine a patterning process parameter202512,322,660Method and apparatus to determine a patterning process parameter202512,142,535Method and apparatus to determine a patterning process parameter using a unit cell having geometric symmetry202412,007,697Method for process metrology202411,947,269Method and apparatus to determine a patterning process parameter202411,784,098Method and apparatus to determine a patterning process parameter202311,733,606Method for performing a manufacturing process and associated apparatuses202311,728,224Method and apparatus to determine a patterning process parameter202311,710,668Method and apparatus to determine a patterning process parameter202311,520,239Separation of contributions to metrology data202211,385,551Method for process metrology202211,378,891Method for determining contribution to a fingerprint202211,314,174Methods and patterning devices and apparatuses for measuring focus performance of a lithographic apparatus, device manufacturing method202211,145,557Method and apparatus to determine a patterning process parameter202111,143,972Method and apparatus to determine a patterning process parameter202111,137,695Method of determining a height profile, a measurement system and a computer readable medium2021Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2021–2025Patents assigned to ASML NETHERLANDS BV (17)· patent assignee history
2021–2025Based in NL· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| ASML NETHERLANDS BV | 17 | 2021–2025 |
Locations
| Location | Patents | Span |
|---|---|---|
| NL | 17 | 2021–2025 |