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Inventor

DAG SONNTAG

Inventor
NL

Overview

3→
Patents
2023–2025
Patent span
Physics
Primary field (CPC G)

Patents· 3 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices33%
G06NComputing arrangements based on specific computational models22%
G05BControl or regulating systems in general11%
G06FElectric digital data processing11%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1011%
Y02PClimate change mitigation technologies in the production or processing of goods11%
PatentTitleYear
12,353,967Method and apparatus for determining feature contribution to performance202512,045,555Method to label substrates based on process parameters202411,714,357Method to predict yield of a device manufacturing process2023

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2023–2025Patents assigned to ASML NETHERLANDS BV (3)· patent assignee history
2023–2025Based in NL· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
ASML NETHERLANDS BV32023–2025
Locations
LocationPatentsSpan
NL32023–2025