Inventor
Mitsuo Saitoh
Inventor
Neyagawa, JP
Overview
Patents· 25 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
H01Jprimary
H01JElectric discharge tubes or discharge lamps38%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1013%
C23CCoating metallic material8%
G04CElectromechanical clocks or watches6%
C09KMaterials for miscellaneous applications, not provided for elsewhere4%
H05HPlasma technique4%
H05KPrinted circuits4%
H10FInorganic semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation4%
C03CChemical composition of glasses, glazes or vitreous enamels2%
G01JMeasurement of intensity, velocity, spectral content, polarisation, phase or pulse characteristics of infrared, visible or ultraviolet light2%
PatentTitleYear
8,772,067'Silicon substrate having textured surface, solar cell having same, and method for producing same'20148,703,613'Plasma processing apparatus and plasma processing method'20148,450,819'Plasma doping method and apparatus thereof'20138,048,476'Method of manufacturing plasma display panel'20117,880,395'Method for restoring function of plasma display panel and plasma display panel'20117,795,811'Plasma display panel'20107,755,286'Glass film, process for production thereof, and optical electronic device'20107,723,919'Front panel for plasma display panel and method for producing the same'20107,690,961'Plasma display panel and process for producing the plasma display panel'20107,686,971'Plasma processing apparatus and method'20107,604,849'Plasma processing method and apparatus'20097,501,762'Plasma display panel and process for producing the same'20097,465,407'Plasma processing method and apparatus'20087,406,925'Plasma processing method and apparatus'20087,329,989'Plasma display panel and process for producing the plasma display panel'20087,280,202'Ingredient analysis method and ingredient analysis apparatus'20077,176,402'Method and apparatus for processing electronic parts'20077,157,659'Plasma processing method and apparatus'20077,056,416'Atmospheric pressure plasma processing method and apparatus'20067,022,937'Plasma processing method and apparatus for performing uniform plasma processing on a linear portion of an object'20067,022,615'Plasma processing method'20066,830,653'Plasma processing method and apparatus'20044,478,524'Arrangement of analog-type electronic wristwatch'19844,477,195'Arrangement of analog-type electronic wristwatch'19844,453,833'Movement structure for hand display type electronic watch'1984Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
1984Patents assigned to CITIZEN WATCH CO LTD (3)· patent assignee history
1984Based in Tanashi, JP· patent location history
2004–2008Patents assigned to MATSUSHITA ELECTRIC INDUSTRIAL CO LTD (9)· patent assignee history
2004–2008Based in Moriguchi, JP· patent location history
2006–2011Based in Neyagawa, JP· patent location history
2008–2014Patents assigned to PANASONIC CORP (13)· patent assignee history
2009–2014Based in Osaka, JP· patent location history
2013–2014Patents assigned to NAKAYAMA ICHIRO (3)· patent assignee history
2013–2014Patents assigned to OKUMURA TOMOHIRO (3)· patent assignee history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| PANASONIC CORP | 13 | 2008–2014 |
| MATSUSHITA ELECTRIC INDUSTRIAL CO LTD | 9 | 2004–2008 |
| CITIZEN WATCH CO LTD | 3 | 1984 |
| NAKAYAMA ICHIRO | 3 | 2013–2014 |
| OKUMURA TOMOHIRO | 3 | 2013–2014 |
Locations
| Location | Patents | Span |
|---|---|---|
| Neyagawa, JP | 12 | 2006–2011 |
| Osaka, JP | 8 | 2009–2014 |
| Tanashi, JP | 3 | 1984 |
| Moriguchi, JP | 2 | 2004–2008 |