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Inventor

Tsutomu Kiyohara

Inventor
Santa Clara, CA, US

Overview

3→
Patents
2011–2016
Patent span
Electricity
Primary field (CPC H)

Patents· 3 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

H10Pprimary
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1027%
H01LSemiconductor devices18%
B05DProcesses for applying fluent materials to surfaces, in general9%
C23CCoating metallic material9%
G02BOptical elements, systems or apparatus9%
H10BElectronic memory devices9%
H10DInorganic electric semiconductor devices9%
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h109%
PatentTitleYear
9,490,116'Gate stack materials for semiconductor applications for lithographic overlay improvement'20168,753,449'Enhancement in UV curing efficiency using oxygen-doped purge for ultra low-K dielectric film'20148,076,250'PECVD oxide-nitride and oxide-silicon stacks for 3D memory application'2011

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2011–2016Patents assigned to APPLIED MATERIALS INC (3)· patent assignee history
2011Patents assigned to HAN XINHAI (1)· patent assignee history
2011Patents assigned to KIM BOK HOEN (1)· patent assignee history
2011Patents assigned to KIYOHARA TSUTOMU (1)· patent assignee history
2011Patents assigned to PARK JI AE (1)· patent assignee history
2011Based in Campbell, CA, US· patent location history
2014–2016Based in Santa Clara, CA, US· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
APPLIED MATERIALS INC32011–2016
HAN XINHAI12011
KIM BOK HOEN12011
KIYOHARA TSUTOMUself12011
PARK JI AE12011
Locations
LocationPatentsSpan
Santa Clara, California, US22014–2016
Campbell, California, US12011