Inventor
Alok Ranjan
Inventor
Austin, TX, US
Overview
Patents· 68 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
H10Pprimary
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1028%
H01LSemiconductor devices27%
H01JElectric discharge tubes or discharge lamps15%
H10DInorganic electric semiconductor devices8%
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h104%
C23CCoating metallic material3%
H05HPlasma technique2%
C01BNon-metallic elements2%
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices2%
G06FElectric digital data processing1%
PatentTitleYear
11,133,194Method for selective etching at an interface between materials202111,094,543Defect correction on metal resists202111,079,682Methods for extreme ultraviolet (EUV) resist patterning development202111,056,347Method for dry etching compound materials202111,043,362Plasma processing apparatuses including multiple electron sources202111,037,798Self-limiting cyclic etch method for carbon-based films202110,860,060Battery protection and intelligent cooling for computing devices202010,818,502System and method of plasma discharge ignition to reduce surface particles202010,818,482Methods for stability monitoring and improvements to plasma sources for plasma processing202010,818,507Method of etching silicon nitride layers for the manufacture of microelectronic workpieces202010,811,269Method to achieve a sidewall etch202010,811,273Methods of surface restoration for nitride etching202010,777,385Method for RF power distribution in a multi-zone electrode array202010,770,305Method of atomic layer etching of oxide202010,701,103Securing devices using network traffic analysis and software-defined networking (SDN)202010,699,911Method of conformal etching selective to other materials202010,658,192Selective oxide etching method for self-aligned multiple patterning202010,651,017Method for operation instability detection in a surface wave plasma source202010,607,852Selective nitride etching method for self-aligned multiple patterning202010,541,146Method of cyclic plasma etching of organic film using sulfur-based chemistry202010,535,531Method of cyclic plasma etching of organic film using carbon-based chemistry202010,529,589Method of plasma etching of silicon-containing organic film using sulfur-based chemistry202010,529,540Advanced methods for plasma systems operation202010,515,814Method of quasi-atomic layer etching of silicon nitride201910,490,404Method of in situ hard mask removal201910,483,127Methods for high precision plasma etching of substrates201910,446,407Method of preferential silicon nitride etching using sulfur hexafluoride201910,446,405Method of anisotropic extraction of silicon nitride mandrel for fabrication of self-aligned block structures201910,431,470Method of quasi-atomic layer etching of silicon nitride201910,381,235Method of selective silicon nitride etching201910,373,828Method of sidewall image transfer201910,366,902Methods for cyclic etching of a patterned layer201910,340,137Monolayer film mediated precision film deposition201910,312,102Method of quasi-atomic layer etching of silicon nitride201910,304,688Method of quasi-atomic layer etching of silicon nitride201910,290,506Method for etching high-K dielectric using pulsed bias power201910,243,805Web-based network topology viewer201910,237,916Systems and methods for ESC temperature control201910,211,065Methods for high precision plasma etching of substrates201910,204,832Method of patterning intersecting structures201910,192,743Method of anisotropic extraction of silicon nitride mandrel for fabrication of self-aligned block structures201910,178,538Aerial communication framework for providing communication services to users trapped in emergency201910,115,591Selective SiARC removal201810,083,820Dual-frequency surface wave plasma source201810,063,062Method of detecting plasma discharge in a plasma processing system20189,966,312Method for etching a silicon-containing substrate20189,947,597Defectivity metrology during DSA patterning20189,881,807'Method for atomic layer etching'20189,779,952'Method for laterally trimming a hardmask'20179,768,033'Methods for high precision etching of substrates'20179,666,447'Method for selectivity enhancement during dry plasma etching'20179,607,843'Method for roughness improvement and selectivity enhancement during arc layer etch via adjustment of carbon-fluorine content'20179,576,816'Method for roughness improvement and selectivity enhancement during arc layer etch using hydrogen'20179,570,313'Method for etching high-K dielectric using pulsed bias power'20179,530,667'Method for roughness improvement and selectivity enhancement during arc layer etch using carbon'20169,530,626'Method and apparatus for ESC charge control for wafer clamping'20169,378,975'Etching method to form spacers having multiple film layers'20169,318,343'Method to improve etch selectivity during silicon nitride spacer etch'20169,159,575'Method for etching high-K dielectric using pulsed bias power'20159,155,183'Adjustable slot antenna for control of uniformity in a surface wave plasma source'20159,111,746'Method for reducing damage to low-k gate spacer during etching'20159,101,042'Control of uniformity in a surface wave plasma source'20159,054,050'Method for deep silicon etching using gas pulsing'20158,906,760'Aspect ratio dependent deposition to improve gate spacer profile, fin-loss and hardmask-loss for FinFET scheme'20148,809,194'Formation of SiOCl-containing layer on spacer sidewalls to prevent CD loss during spacer etch'20148,735,291'Method for etching high-k dielectric using pulsed bias power'20148,592,327'Formation of SiOCl-containing layer on exposed low-k surfaces to reduce low-k damage'20138,551,877'Sidewall and chamfer protection during hard mask removal for interconnect patterning'2013Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2013–2021Patents assigned to TOKYO ELECTRON LTD (64)· patent assignee history
2013–2015Patents assigned to RANJAN ALOK (5)· patent assignee history
2013–2014Patents assigned to KUMAR KAUSHIK ARUN (3)· patent assignee history
2013–2015Based in Slingerlands, NY, US· patent location history
2015–2020Based in Mechanicville, NY, US· patent location history
2018–2021Based in Austin, TX, US· patent location history
2018–2020Based in Tomiya, JP· patent location history
2019–2020Patents assigned to DELL PRODUCTS LP (2)· patent assignee history
2019–2020Based in Bangalore, IN· patent location history
2020Patents assigned to EMC IP HOLDING CO LLC (1)· patent assignee history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| TOKYO ELECTRON LTD | 64 | 2013–2021 |
| RANJAN ALOKself | 5 | 2013–2015 |
| KUMAR KAUSHIK ARUN | 3 | 2013–2014 |
| DELL PRODUCTS LP | 2 | 2019–2020 |
| EMC IP HOLDING CO LLC | 1 | 2020 |
Locations
| Location | Patents | Span |
|---|---|---|
| Austin, Texas, US | 26 | 2018–2021 |
| Mechanicville, New York, US | 19 | 2015–2020 |
| Tomiya, JP | 10 | 2018–2020 |
| Slingerlands, New York, US | 9 | 2013–2015 |
| Bangalore, IN | 3 | 2019–2020 |