Inventor

Michael S. Hibbs

Inventor

Westford, VT, US

Overview

42→

Patents

1994–2014

Patent span

Physics

Primary field (CPC G)

Patents· 42 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G03Fprimary

G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices60%

C23CCoating metallic material8%

B23KSoldering or unsoldering6%

G01NInvestigating or analysing materials by determining their chemical or physical properties5%

H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h105%

Y10TTechnical subjects covered by former us classification5%

G03BApparatus or arrangements for taking photographs or for projecting or viewing them3%

G01JMeasurement of intensity, velocity, spectral content, polarisation, phase or pulse characteristics of infrared, visible or ultraviolet light2%

G01RMeasuring electric variables2%

G02FOptical devices or arrangements for the control of light by modification of the optical properties of the media of the elements involved therein2%

PatentTitleYear

8,815,475'Reticle carrier'2014 8,439,728'Reticle carrier'2013 8,271,910'EMF correction model calibration using asymmetry factor data obtained from aerial images or a patterned layer'2012 8,110,321'Method of manufacture of damascene reticle'2012 7,742,632'Alternating phase shift mask inspection using biased inspection data'2010 7,642,016'Phase calibration for attenuating phase-shift masks'2010 7,492,941'Mask defect analysis system'2009 7,492,940'Mask defect analysis system'2009 7,416,820'Pellicle film optimized for immersion lithography systems with NA>1'2008 7,257,247'Mask defect analysis system'2007 7,239,376'Method and apparatus for correcting gravitational sag in photomasks used in the production of electronic devices'2007 7,134,933'Wafer thickness control during backside grind'2006 7,060,403'In-situ pellicle monitor'2006 7,061,590'Pellicle distortion reduction'2006 6,979,518'Attenuated embedded phase shift photomask blanks'2005 6,950,183'Apparatus and method for inspection of photolithographic mask'2005 6,887,126'Wafer thickness control during backside grind'2005 6,858,357'Attenuated embedded phase shift photomask blanks'2005 6,835,502'In-situ pellicle monitor'2004 6,834,548'Method and apparatus for reduction of high-frequency vibrations in thick pellicles'2004 6,824,932'Self-aligned alternating phase shift mask patterning process'2004 6,730,445'Attenuated embedded phase shift photomask blanks'2004 6,731,378'Pellicle distortion reduction'2004 6,682,860'Attenuated embedded phase shift photomask blanks'2004 6,653,027'Attenuated embedded phase shift photomask blanks'2003 6,627,361'Assist features for contact hole mask patterns'2003 6,582,857'Repair of masks to promote adhesion of patches'2003 6,368,881'Wafer thickness control during backside grind'2002 6,284,443'Method and apparatus for image adjustment'2001 6,190,836'Methods for repair of photomasks'2001 6,165,649'Methods for repair of photomasks'2000 6,156,461'Method for repair of photomasks'2000 6,122,056'Direct phase shift measurement between interference patterns using aerial image measurement tool'2000 6,110,624'Multiple polarity mask exposure method'2000 6,096,458'Methods for manufacturing photolithography masks utilizing interfering beams of radiation'2000 6,090,507'Methods for repair of photomasks'2000 5,973,771'Pupil imaging reticle for photo steppers'1999 5,955,222'Method of making a rim-type phase-shift mask and mask manufactured thereby'1999 5,614,990'Illumination tailoring system using photochromic filter'1997 5,552,718'Electrical test structure and method for space and line measurement'1996 5,508,803'Method and apparatus for monitoring lithographic exposure'1996 5,300,786'Optical focus phase shift test pattern, monitoring system and process'1994

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

1994–2014Patents assigned to IBM (42)· patent assignee history

1994–2014Based in Westford, VT, US· patent location history

2012–2013Patents assigned to HIBBS MICHAEL S (3)· patent assignee history

2012–2013Patents assigned to CANAPERI DONALD F (2)· patent assignee history

2012–2013Patents assigned to GRABARZ HENRY (2)· patent assignee history

2012–2013Patents assigned to KRISHNAN MAHADEVAIYER (2)· patent assignee history

Inventor activity

Assignee and location history derived from the patent record.

Assignees

Assignee	Patents	Span
IBM	42	1994–2014
HIBBS MICHAEL Sself	3	2012–2013
CANAPERI DONALD F	2	2012–2013
GRABARZ HENRY	2	2012–2013
KRISHNAN MAHADEVAIYER	2	2012–2013

Locations

Location	Patents	Span
Westford, VT, US	42	1994–2014