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Inventor

Yajuan SU

Inventor
CN

Overview

2→
Patents
2025
Patent span
Electricity
Primary field (CPC H)

Patents· 2 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices40%
H01LSemiconductor devices20%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1020%
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h1020%
PatentTitleYear
12,222,641Method and device for optimizing mask parameters202512,198,930Method for manufacturing semiconductor device2025

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2025Patents assigned to INST OF MICROELECTRONICS CAS (2)· patent assignee history
2025Based in CN· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
INST OF MICROELECTRONICS CAS22025
Locations
LocationPatentsSpan
CN22025