Inventor
Weitian KOU
Inventor
NL
Overview
Patents· 6 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices40%
G05BControl or regulating systems in general27%
Y02PClimate change mitigation technologies in the production or processing of goods13%
G06FElectric digital data processing7%
G06TImage data processing or generation, in general7%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h107%
PatentTitleYear
12,124,179Method of wafer alignment using at resolution metrology on product features202412,044,981Method and apparatus for optimization of lithographic process202411,782,349Methods of determining corrections for a patterning process, device manufacturing method, control system for a lithographic apparatus and lithographic apparatus202311,592,753Methods of determining corrections for a patterning process, device manufacturing method, control system for a lithographic apparatus and lithographic apparatus202311,448,973Computational metrology based correction and control202211,327,407Methods of determining corrections for a patterning process, device manufacturing method, control system for a lithographic apparatus and lithographic apparatus2022Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2022–2024Patents assigned to ASML NETHERLANDS BV (6)· patent assignee history
2022–2024Based in NL· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| ASML NETHERLANDS BV | 6 | 2022–2024 |
Locations
| Location | Patents | Span |
|---|---|---|
| NL | 6 | 2022–2024 |