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Inventor

Masayuki Endou

Inventor
Kadoma, JP

Overview

4→
Patents
1992–2011
Patent span
Physics
Primary field (CPC G)

Patents· 4 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices44%
C08GMacromolecular compounds obtained otherwise than by reactions only involving unsaturated carbon-to-carbon bonds22%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests22%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1011%
PatentTitleYear
8,067,148'Pattern forming method'20117,998,658'Pattern forming method'20115,254,439'Light-sensitive polymer, method for preparing the same and method for forming patterns'19935,126,419'Light-sensitive polymer, method for preparing the same andmethod for forming patterns'1992

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

1992–1993Patents assigned to MATSUSHITA ELECTRIC INDUSTRIAL CO LTD (2)· patent assignee history
1992–1993Patents assigned to SHINETSU CHEMICAL CO (2)· patent assignee history
1992–1993Based in Kadoma, JP· patent location history
2011Patents assigned to PANASONIC CORP (2)· patent assignee history
2011Patents assigned to ENDOU MASAYUKI (1)· patent assignee history
2011Patents assigned to SASAGO MASARU (1)· patent assignee history
2011Based in Toyama, JP· patent location history
2011Based in Osaka, JP· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
MATSUSHITA ELECTRIC INDUSTRIAL CO LTD21992–1993
PANASONIC CORP22011
SHINETSU CHEMICAL CO21992–1993
ENDOU MASAYUKIself12011
SASAGO MASARU12011
Locations
LocationPatentsSpan
Kadoma, JP21992–1993
Toyama, JP12011
Osaka, JP12011