Inventor

NOBORU SAITO

Inventor

Overview

2→

Patents

2025

Patent span

Performing operations

Primary field (CPC B)

Patents· 2 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

B22Fprimary

B22FWorking metallic powder14%

B29CShaping or joining of plastics14%

B33YAdditive manufacturing, i.e. manufacturing of three-dimensional [3d] objects by additive deposition, additive agglomeration or additive layering, e.g. by 3d printing, stereolithography or selective laser sintering14%

H01JElectric discharge tubes or discharge lamps14%

H01LSemiconductor devices14%

H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1014%

Y02PClimate change mitigation technologies in the production or processing of goods14%

PatentTitleYear

12,459,038Additive manufacturing method2025 12,400,835Plasma processing method and plasma processing system2025

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2025Patents assigned to HITACHI LTD (1)· patent assignee history

2025Patents assigned to TOKYO ELECTRON LTD (1)· patent assignee history

2025Based in JP· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees

Assignee	Patents	Span
HITACHI LTD	1	2025
TOKYO ELECTRON LTD	1	2025

Locations

Location	Patents	Span
JP	2	2025