Inventor
Makoto Namikawa
Inventor
Ibaraki, JP
Overview
21→
Patents
2000–2015
Patent span
General tagging of new technological developments
Primary field (CPC Y)
Patents· 21 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
Y10Tprimary
Y10TTechnical subjects covered by former us classification25%
B08BCleaning in general15%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1013%
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices10%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests6%
B32BLayered products, i.e. products built-up of strata of flat or non-flat, e.g. cellular or honeycomb, form4%
C09JAdhesives4%
C11DDetergent compositions4%
B29CShaping or joining of plastics3%
G02FOptical devices or arrangements for the control of light by modification of the optical properties of the media of the elements involved therein3%
PatentTitleYear
9,131,829'Label sheet for cleaning and conveying member having cleaning function'20158,597,456'Method for producing organic EL device and substrate for producing organic EL device'20138,460,783'Cleaning sheets, transfer member having cleaning function, and method of cleaning substrate-processing apparatus with these'20137,846,258'Cleaning sheet and method of cleaning substrate processing equipment'20107,793,668'Cleaning sheet, conveying member using the same, and substrate processing equipment cleaning method using them'20107,718,255'Cleaning sheets and method of cleaning with the same'20107,713,356'Cleaning sheet, conveying member using the same, and substrate processing equipment cleaning method using them'20107,615,288'Cleaning member and cleaning method'20097,575,812'Cleaning substrate of substrate processing equipment and heat resistant resin preferable therefor'20097,575,790'Cleaning sheet and process for cleaning substrate treatment device using same'20096,821,620'Cleaning sheet, conveying member using the same, and substrate processing equipment cleaning method using them'20046,652,700'Organic electroluminescence device and method for producing the same'20036,602,599'Low-staining adhesive sheets and method for removing resist material'20036,565,704'Process for the removal of resist material'20036,471,882'Process for producing head slider'20026,436,220'Process for the collective removal of resist material and side wall protective film'20026,245,188'Process for the removal of resist material'20016,235,144'Resist removing apparatus and method'20016,099,675'Resist removing method'20006,086,701'Process for the production of stamper'20006,040,110'Process and apparatus for the removal of resist'2000Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2000–2015Patents assigned to NITTO DENKO CORP (21)· patent assignee history
2000–2013Based in Ibaraki, JP· patent location history
2000–2015Based in Osaka, JP· patent location history
2013Patents assigned to NAMIKAWA MAKOTO (2)· patent assignee history
2013Patents assigned to NUKAGA JIROU (1)· patent assignee history
2013Patents assigned to TERADA YOSHIO (1)· patent assignee history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| NITTO DENKO CORP | 21 | 2000–2015 |
| NAMIKAWA MAKOTOself | 2 | 2013 |
| NUKAGA JIROU | 1 | 2013 |
| TERADA YOSHIO | 1 | 2013 |
Locations
| Location | Patents | Span |
|---|---|---|
| Ibaraki, JP | 11 | 2000–2013 |
| Osaka, JP | 10 | 2000–2015 |