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Inventor

Gregory D. Cooper

Inventor
Fulton, MD, US

Overview

26→
Patents
2001–2021
Patent span
Electricity
Primary field (CPC H)

Patents· 26 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices13%
H01LSemiconductor devices10%
H10KOrganic electric solid-state devices9%
B82YSpecific uses or applications of nanostructures7%
Y10TTechnical subjects covered by former us classification7%
C09DCoating compositions, e.g. paints, varnishes or lacquers6%
C08KUse of inorganic or non-macromolecular organic substances as compounding ingredients5%
G02BOptical elements, systems or apparatus5%
C08LCompositions of macromolecular compounds4%
B05DProcesses for applying fluent materials to surfaces, in general3%
PatentTitleYear
11,034,845Nanocomposite formulations for optical applications202110,961,398High refractive index silicone nanocomposites202110,844,231Nanocomposite formulations for optical applications202010,647,938Nano-additives enabled advanced lubricants202010,522,791Advanced light extraction structure201910,516,140Advanced light extraction structure201910,273,365High refractive index nanocomposite201910,179,860High refractive index silicone nanocomposites201910,144,842High refractive index nanocomposite layer201810,050,236Advanced light extraction structure201810,033,014Advanced light extraction structure20189,207,538'Applications of semiconductor nano-sized particles for photolithography'20159,048,009'Highly conductive composites'20158,993,221'Block co-polymer photoresist'20158,383,316'Resists for lithography'20138,344,053'Highly conductive composites'20137,649,615'Advanced exposure techniques for programmable lithography'20107,605,390'Programmable photolithographic mask based on semiconductor nano-particle optical modulators'20097,524,616'Applications of semiconductor nano-sized particles for photolithography'20097,510,818'Reversible photobleachable materials based on nano-sized semiconductor particles and their optical applications'20097,050,155'Advanced exposure techniques for programmable lithography'20066,888,616'Programmable photolithographic mask system and method'20056,879,376'Method and apparatus for exposing photoresists using programmable masks'20056,600,551'Programmable photolithographic mask system and method'20036,480,261'Photolithographic system for exposing a wafer using a programmable mask'20026,291,110'Methods for transferring a two-dimensional programmable exposure pattern for photolithography'2001

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2001–2015Patents assigned to PIXELLIGENT TECHNOLOGIES LLC (15)· patent assignee history
2001–2005Based in Greenbelt, MD, US· patent location history
2005–2010Based in Alexandria, VA, US· patent location history
2013–2015Patents assigned to COOPER GREGORY D (4)· patent assignee history
2013–2015Patents assigned to CHEN ZHIYUN (2)· patent assignee history
2013–2015Patents assigned to GONEN-WILLIAMS ZEHRA SERPIL (2)· patent assignee history
2013–2015Based in Arlington, VA, US· patent location history
2015–2021Based in Fulton, MD, US· patent location history
2018–2021Patents assigned to PIXELLIGENT TECH LLC (11)· patent assignee history
2019–2021Based in Baltimore, MD, US· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
PIXELLIGENT TECHNOLOGIES LLC152001–2015
PIXELLIGENT TECH LLC112018–2021
COOPER GREGORY Dself42013–2015
CHEN ZHIYUN22013–2015
GONEN-WILLIAMS ZEHRA SERPIL22013–2015
Locations
LocationPatentsSpan
Fulton, Maryland, US92015–2021
Arlington, Virginia, US42013–2015
Alexandria, Virginia, US42005–2010
Greenbelt, Maryland, US42001–2005
Baltimore, Maryland, US32019–2021