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Inventor

Eigo Kawakami

Inventor
Utsunomiya, JP

Overview

46→
Patents
1987–2015
Patent span
Physics
Primary field (CPC G)

Patents· 46 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices28%
B82YSpecific uses or applications of nanostructures18%
B29CShaping or joining of plastics11%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests8%
G01QScanning-probe techniques or apparatus6%
G02BOptical elements, systems or apparatus4%
B29LIndexing scheme associated with subclass b29c, relating to particular articles3%
G03BApparatus or arrangements for taking photographs or for projecting or viewing them3%
G11BInformation storage based on relative movement between record carrier and transducer3%
B81CProcesses or apparatus specially adapted for the manufacture or treatment of microstructural devices or systems2%
PatentTitleYear
9,188,854'Transfer apparatus and method of manufacturing device'20159,039,402'Imprinting apparatus and method therefor'20158,834,144'Imprinting machine and device manufacturing method'20148,770,964'Imprint apparatus and article manufacturing method'20148,734,701'Imprint apparatus and method of manufacturing article'20148,616,874'Pattern transferring apparatus and pattern transferring method'20138,414,279'Imprint apparatus and article manufacturing method'20138,404,169'Imprint apparatus and method of manufacturing article'20138,393,885'Processing apparatus'20138,226,392'Transfer apparatus and method of manufacturing device'20127,846,346'Processing apparatus and method'20107,815,424'Imprinting machine and device manufacturing method'20107,815,425'Processing apparatus'20107,807,065'Processing method'20107,789,647'Processing apparatus and method'20107,785,091'Processing apparatus and device manufacturing method'20107,719,659'Exposure apparatus and device manufacturing method'20107,690,912'Pattern transferring mold, pattern transferring apparatus and device manufacturing method using the same'20107,649,184'Processing method and system'20107,382,434'Exposure apparatus and device manufacturing method'20087,381,272'Processing apparatus'20087,236,231'Exposure apparatus and device manufacturing method'20077,233,383'Exposure apparatus, device manufacturing method, pattern generator and maintenance method to check for pixel deterioration'20077,196,321'Fine pattern forming apparatus and fine pattern inspecting apparatus'20077,180,575'Exposure apparatus and device manufacturing method'20076,990,173'Positioning apparatus, atmosphere substituting method, exposure apparatus, and device manufacturing method'20065,994,698'Microprobe, preparation thereof and electronic device by use of said microprobe'19995,721,721'Two scanning probes information recording/reproducing system with one probe to detect atomic reference location on a recording medium'19985,641,264'Substrate conveying device and method of controlling the same'19975,519,686'Encoder for controlling measurements in the range of a few angstroms'19965,482,002'Microprobe, preparation thereof and electronic device by use of said microprobe'19965,443,932'Exposure method'19955,276,725'Exposure system'19945,255,258'Microprobe, preparation thereof and electronic device by use of said microprobe'19935,226,523'Conveying apparatus and method of controlling the same'19935,157,700'Exposure apparatus for controlling intensity of exposure radiation'19925,072,116'Microprobe preparation thereof and electronic device by use of said microprobe'19915,008,703'Exposure apparatus and control of the same'19914,985,186'Process for producing optical element'19914,971,455'Slider'19904,802,746'Variable-focus optical element and focus detecting device utilizing the same'19894,788,596'Image stabilizing device'19884,780,739'Anti-vibration imaging device'19884,685,766'Optical device'19874,667,316'Information recording-reproducing apparatus'19874,640,592'Optical display utilizing thermally formed bubble in a liquid core waveguide'1987

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

1987–2015Patents assigned to CANON KK (46)· patent assignee history
1987–1990Based in Kawasaki, JP· patent location history
1988–1991Based in Atsugi, JP· patent location history
1991–1999Based in Ebina, JP· patent location history
2006–2015Based in Utsunomiya, JP· patent location history
2007–2010Based in Tochigi, JP· patent location history
2012–2015Patents assigned to KAWAKAMI EIGO (10)· patent assignee history
2013–2014Patents assigned to KASUMI KAZUYUKI (4)· patent assignee history
2013–2015Patents assigned to INA HIDEKI (3)· patent assignee history
2013–2014Patents assigned to NAKAMURA TAKASHI (3)· patent assignee history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
CANON KK461987–2015
KAWAKAMI EIGOself102012–2015
KASUMI KAZUYUKI42013–2014
INA HIDEKI32013–2015
NAKAMURA TAKASHI32013–2014
Locations
LocationPatentsSpan
Utsunomiya, JP202006–2015
Ebina, JP121991–1999
Tochigi, JP52007–2010
Kawasaki, JP51987–1990
Atsugi, JP31988–1991