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Inventor

Keiko Matsuda

Inventor
Machida, JP

Overview

4→
Patents
1987–2021
Patent span
Physics
Primary field (CPC G)

Patents· 4 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices50%
G03GElectrography17%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests17%
Y10TTechnical subjects covered by former us classification17%
PatentTitleYear
11,067,938Cleaning unit, cartridge, image forming apparatus20214,837,123'Mask structure for lithography, method of preparation thereof and lithographic method'19894,804,600'Lithographic mask structure and process for preparing the same'19894,677,042'Mask structure for lithography, method for preparation thereof and lithographic method'1987

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

1987–2021Patents assigned to CANON KK (4)· patent assignee history
1987–1989Based in Machida, JP· patent location history
1989Based in Tokyo, JP· patent location history
2021Based in Fujisawa, JP· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
CANON KK41987–2021
Locations
LocationPatentsSpan
Machida, JP21987–1989
Fujisawa, JP12021
Tokyo, JP11989