Inventor

Chih-Tsung Shih

Inventor

Hsinchu, TW

Overview

2007–2021

Patent span

Electricity

Primary field (CPC H)

Patents· 76 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G03Fprimary

G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices30%

H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1016%

H01LSemiconductor devices13%

H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h1010%

B82YSpecific uses or applications of nanostructures3%

C12QMeasuring or testing processes involving enzymes, nucleic acids or microorganisms3%

G01NInvestigating or analysing materials by determining their chemical or physical properties3%

G06FElectric digital data processing2%

H01JElectric discharge tubes or discharge lamps2%

B29CShaping or joining of plastics2%

PatentTitleYear

11,024,623Layout modification method for exposure manufacturing process2021 10,871,713Method of controlling reticle masking blade positioning to minimize impact on critical dimension uniformity and device for controlling reticle masking blade positioning2020 10,852,649Methods and apparatus for removing contamination from lithographic tool2020 10,831,094Pellicle for EUV mask and fabrication thereof2020 10,824,080Method to reduce native defect printability2020 10,756,016Interconnection structure and methods of fabrication the same2020 10,747,097Mask with multilayer structure and manufacturing method by using the same2020 10,720,419Layout modification method for exposure manufacturing process2020 10,712,651Method and apparatus for collecting information used in image-error compensation2020 10,642,148High durability extreme ultraviolet photomask2020 10,642,158Method of controlling reticle masking blade positioning to minimize impact on critical dimension uniformity and device for controlling reticle masking blade positioning2020 10,534,279Methods and apparatus for removing contamination from lithographic tool2020 10,520,806Pellicle for EUV mask and fabrication thereof2019 10,522,464Interconnection structure and methods of fabrication the same2019 10,509,334Methods and apparatus for removing contamination from lithographic tool2019 10,366,973Layout modification method for exposure manufacturing process2019 10,274,819EUV pellicle fabrication methods and structures thereof2019 10,276,372Method for integrated circuit patterning2019 10,168,611Mask with multilayer structure and manufacturing method by using the same2019 10,061,191High durability extreme ultraviolet photomask2018 10,031,411Pellicle for EUV mask and fabrication thereof2018 10,007,174Extreme ultraviolet lithography process and mask2018 9,995,683Apparatus for single-molecule detection2018 9,886,543'Method providing for asymmetric pupil configuration for an extreme ultraviolet lithography process'2018 9,869,928'Extreme ultraviolet light (EUV) photomasks, and fabrication methods thereof'2018 9,823,585'EUV focus monitoring systems and methods'2017 9,786,602'Interconnection structure and methods of fabrication the same'2017 9,777,321'Single molecule detection system and methods'2017 9,766,536'Mask with multilayer structure and manufacturing method by using the same'2017 9,748,133'Via definition scheme'2017 9,726,983'Method to define multiple layer patterns with a single exposure by charged particle beam lithography'2017 9,728,408'Method of semiconductor integrated circuit fabrication'2017 9,709,884'EUV mask and manufacturing method by using the same'2017 9,685,367'Photomask for forming multiple layer patterns with a single exposure'2017 9,679,803'Method for forming different patterns in a semiconductor structure using a single mask'2017 9,664,999'Method of making an extreme ultraviolet pellicle'2017 9,612,523'Structure and method for reflective-type mask'2017 9,588,417'Photomask pellicle'2017 9,588,419'Extreme ultraviolet light (EUV) photomasks and fabrication methods thereof'2017 9,557,649'Assist feature for a photolithographic process'2017 9,535,316'Photomask with three states for forming multiple layer patterns with a single exposure'2017 9,529,249'Extreme ultraviolet lithography process and mask'2016 9,482,615'Single-molecule detection system and methods'2016 9,442,368'Method of making an extreme ultraviolet pellicle'2016 9,418,862'Method for integrated circuit patterning'2016 9,412,647'Via definition scheme'2016 9,405,195'Method to define multiple layer patterns with a single exposure by charged particle beam lithography'2016 9,389,506'Photoresist having improved extreme-ultraviolet lithography imaging performance'2016 9,354,507'Extreme ultraviolet lithography process and mask'2016 9,316,900'Extreme ultraviolet lithography process and mask'2016 9,310,675'Extreme ultraviolet light (EUV) photomasks, and fabrication methods thereof'2016 9,285,673'Assist feature for a photolithographic process'2016 9,280,046'Method of fabricating mask'2016 9,256,123'Method of making an extreme ultraviolet pellicle'2016 9,257,282'Method of semiconductor integrated circuit fabrication'2016 9,252,048'Metal and via definition scheme'2016 9,213,232'Reflective mask and method of making same'2015 9,184,054'Method for integrated circuit patterning'2015 9,134,604'Extreme ultraviolet (EUV) mask and method of fabricating the EUV mask'2015 9,091,947'Extreme ultraviolet light (EUV) photomasks and fabrication methods thereof'2015 9,081,280'Photoresist having improved extreme-ultraviolet lithography imaging performance'2015 9,081,288'Extreme ultraviolet (EUV) mask, method of fabricating the EUV mask and method of inspecting the EUV mask'2015 9,081,312'Method to define multiple layer patterns with a single exposure by E-beam lithography'2015 9,046,781'Structure and method for reflective-type mask'2015 8,877,409'Reflective mask and method of making same'2014 8,865,078'Apparatus for single-molecule detection'2014 8,865,077'Apparatus for single-molecule detection'2014 8,791,024'Method to define multiple layer patterns using a single exposure'2014 8,721,969'Apparatus for single-molecule detection'2014 8,304,785'LED structure, manufacturing method thereof and LED module'2012 8,265,436'Bonding system for optical alignment'2012 8,129,726'Light-emitting diode package having electrostatic discharge protection function and method of fabricating the same'2012 7,800,578'Method for driving a light source and a backing light source'2010 7,720,320'Electro-optical modulator with curving resonator'2010 7,447,387'Electro-optical modulator with curving resonator'2008 7,295,373'Power polarization beam combiner and its applications in fiber communication'2007

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2007–2018Patents assigned to IND TECH RES INST (12)· patent assignee history

2007–2021Based in Hsinchu, TW· patent location history

2012–2016Patents assigned to SHIH CHIH-TSUNG (8)· patent assignee history

2014–2016Patents assigned to TAIWAN SEMICONDUCTOR MFG (16)· patent assignee history

2014–2016Patents assigned to CHIOU CHUNG-FAN (3)· patent assignee history

2015–2021Patents assigned to TAIWAN SEMICONDUCTOR MFG CO LTD (47)· patent assignee history

Inventor activity

Assignee and location history derived from the patent record.

Assignees

Assignee	Patents	Span
TAIWAN SEMICONDUCTOR MFG CO LTD	47	2015–2021
TAIWAN SEMICONDUCTOR MFG	16	2014–2016
IND TECH RES INST	12	2007–2018
SHIH CHIH-TSUNGself	8	2012–2016
CHIOU CHUNG-FAN	3	2014–2016

Locations

Location	Patents	Span
Hsinchu, TW	76	2007–2021