Inventor
NAOKI MATSUHASHI
Inventor
JP
Overview
Patents· 6 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices60%
H01LSemiconductor devices20%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1020%
PatentTitleYear
12,535,728Photomask blank, manufacturing method of photomask and photomask202612,372,863Photomask blank, method for producing photomask, and photomask202512,197,121Phase shift mask blank, manufacturing method of phase shift mask, and phase shift mask202511,971,653Photomask blank, method for producing photomask, and photomask202411,422,456Phase shift mask blank, method for producing phase shift mask, and phase shift mask202211,402,744Photomask blank, manufacturing method of photomask and photomask2022Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2022–2026Patents assigned to SHINETSU CHEMICAL CO (6)· patent assignee history
2022–2026Based in JP· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| SHINETSU CHEMICAL CO | 6 | 2022–2026 |
Locations
| Location | Patents | Span |
|---|---|---|
| JP | 6 | 2022–2026 |