Inventor

Yongsun Ko

Inventor
Suwon-si, KR

Overview

23→
Patents
2015–2020
Patent span
Electricity
Primary field (CPC H)

Patents· 23 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

H01Lprimary
H01LSemiconductor devices30%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1024%
C09KMaterials for miscellaneous applications, not provided for elsewhere8%
C23FNon-mechanical removal of metallic material from surface8%
H10DInorganic electric semiconductor devices8%
H10BElectronic memory devices6%
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h106%
F26BDrying solid materials or objects by removing liquid therefrom3%
H01JElectric discharge tubes or discharge lamps3%
H10NElectric solid-state devices not otherwise provided for3%
PatentTitleYear
10,580,617Method and apparatus for plasma etching202010,361,100Apparatus and methods for treating a substrate201910,242,880Method of wet etching and method of fabricating semiconductor device using the same201910,155,903Metal etchant compositions and methods of fabricating a semiconductor device using the same201810,128,120Method of treating a layer201810,096,453Method and apparatus for plasma etching201810,084,051Semiconductor devices including field effect transistors and methods of fabricating the same20189,941,110Manufacturing method and fluid supply system for treating substrate20189,934,959Method and apparatus for purifying cleaning agent20189,859,432'Semiconductor devices having spacer protection pattern'20189,735,351'Magneto-resistance random access memory device and method of manufacturing the same'20179,677,002'Etching composition'20179,660,186'Method of inspecting by-products and method of manufacturing semiconductor device using the same'20179,627,233'Substrate treating apparatus'20179,595,434'Apparatus and methods for manufacturing semiconductor devices and treating substrates'20179,589,901'Semiconductor wafers including indications of crystal orientation and methods of forming the same'20179,534,839'Apparatus and methods for treating a substrate'20179,524,864'Manufacturing method and fluid supply system for treating substrate'20169,368,647'Compositions for etching'20169,165,759'Etching composition and method of manufacturing semiconductor device using the same'20159,136,120'Compositions for etching and methods of forming a semiconductor device using the same'20159,027,576'Substrate treatment systems using supercritical fluid'20158,940,182'Compositions for etching and methods of forming a semiconductor device using the same'2015

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2015–2020Patents assigned to SAMSUNG ELECTRONICS CO LTD (23)· patent assignee history
2015–2019Patents assigned to KO YONGSUN (6)· patent assignee history
2015–2016Patents assigned to SOULBRAIN CO LTD (3)· patent assignee history
2015–2019Patents assigned to HAN HOON (2)· patent assignee history
2015–2018Patents assigned to JEONG JIHOON (2)· patent assignee history
2015–2020Based in Suwon-si, KR· patent location history
2015–2016Based in Hwaseong-si, KR· patent location history
2018Based in Gyeonggi-do, KR· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
SAMSUNG ELECTRONICS CO LTD232015–2020
KO YONGSUNself62015–2019
SOULBRAIN CO LTD32015–2016
HAN HOON22015–2019
JEONG JIHOON22015–2018
Locations
LocationPatentsSpan
Suwon-si, KR202015–2020
Hwaseong-si, KR22015–2016
Gyeonggi-do, KR12018