Inventor
CHANGSOO WOO
Inventor
KR
Overview
Patents· 5 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices28%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1028%
C07FAcyclic, carbocyclic or heterocyclic compounds containing elements other than carbon, hydrogen, halogen, oxygen, nitrogen, sulfur, selenium or tellurium22%
H01LSemiconductor devices22%
PatentTitleYear
12,538,761Composition for semiconductor photoresist, and pattern formation method using same202612,306,534Semiconductor photoresist composition and method of forming patterns using the composition202512,158,699Semiconductor photoresist composition and method of forming patterns using the composition202412,013,635Semiconductor photoresist composition and method of forming patterns using the composition202411,415,885Semiconductor photoresist composition, and method of forming patterns using the composition2022Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2022–2026Patents assigned to SAMSUNG SDI CO LTD (5)· patent assignee history
2022–2026Based in KR· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| SAMSUNG SDI CO LTD | 5 | 2022–2026 |
Locations
| Location | Patents | Span |
|---|---|---|
| KR | 5 | 2022–2026 |