Inventor
Zhuangxiong HUANG
Inventor
NL
Overview
Patents· 6 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices67%
G01NInvestigating or analysing materials by determining their chemical or physical properties11%
G02BOptical elements, systems or apparatus11%
H05GX-ray technique11%
PatentTitleYear
12,411,425Fluid purging system202512,346,031Methods and patterning devices and apparatuses for measuring focus performance of a lithographic apparatus, device manufacturing method202512,332,570Lithographic system provided with a deflection apparatus for changing a trajectory of particulate debris202512,292,696Fluid purging system, projection system, illumination system, lithographic apparatus, and method202512,158,705End-of-life monitoring of dynamic gas lock membranes and pupil facet mirrors and detection of membrane rupture in lithographic apparatuses202411,703,768Lithographic apparatus and related methods2023Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2023–2025Patents assigned to ASML NETHERLANDS BV (6)· patent assignee history
2023–2025Based in NL· patent location history
2024–2025Patents assigned to ASML HOLDING NV (2)· patent assignee history
2024Patents assigned to ASML HOLDING N V & ASML NETHERLANDS B V (1)· patent assignee history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| ASML NETHERLANDS BV | 6 | 2023–2025 |
| ASML HOLDING NV | 2 | 2024–2025 |
| ASML HOLDING N V & ASML NETHERLANDS B V | 1 | 2024 |
Locations
| Location | Patents | Span |
|---|---|---|
| NL | 6 | 2023–2025 |