Inventor
Takashi Kitahara
Inventor
Matsuda, JP
Overview
Patents· 38 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
H10Wprimary
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h1022%
F28FDetails of heat-exchange and heat-transfer apparatus, of general application10%
H01LSemiconductor devices8%
G06FElectric digital data processing7%
H03FAmplifiers7%
H05KPrinted circuits5%
H10DInorganic electric semiconductor devices5%
A61KPreparations for medical, dental or toiletry purposes4%
F28DHeat-exchange apparatus, not provided for in another subclass, in which the heat-exchange media do not come into direct contact4%
A61QSpecific use of cosmetics or similar toiletry preparations3%
PatentTitleYear
10,965,194Heat pipe, rotor, and rotary electric machine202110,868,155Compound semiconductor device202010,714,602Compound semiconductor device202010,404,226Power amplifier module201910,276,701Compound semiconductor device201910,264,677Electronic component and manufacturing method therefor20199,831,329Compound semiconductor device20179,825,156'Compound semiconductor device'20179,768,639'Vehicle-mounted power source device'20179,317,438'Cache memory apparatus, cache control method, and microprocessor system'20169,030,032'Semiconductor device with peeling prevention marks and shield film'20159,028,797'Composite body for antigen or drug delivery'20158,546,939'RF module including control IC without the aid of a relay pad'20137,778,350'Multi-carrier communication device, and multi-carrier communication method'20107,522,026'Alignment method and system for electromagnet in high-energy accelerator'20097,504,116'Hair growth inhibitor and depilation accelerator'20097,488,499'Herbal hair growth inhibitor and depilation accelerator'20097,465,215'Sponge blasting apparatus and sponge blasting method'20086,943,590'Clock monitoring apparatus'20056,670,839'Clock monitoring apparatus'20036,549,404'Semiconductor module apparatus and cooling apparatus'20036,329,409'Amine derivatives and skin preparations for external use containing the same'20016,243,263'Heat radiation device for a thin electronic apparatus'20016,166,904'Heat generating element cooling device'20006,143,977'Heat-generating element cooling device'20006,140,571'Heat-generating element cooling device'20006,067,227'Heat sink for cooling a heat producing element and application'20006,011,216'Heat-generating element cooling device'20005,940,267'Heat sink for cooling a heat producing element and application'19995,760,333'Heat-generating element cooling device'19985,756,931'Heat-generating element cooling device'19985,650,912'Heat sink for cooling a heat producing element and application'19975,646,184'Preparation for external application to the skin and novel benzoic acid derivatives'19975,629,560'Integrated circuit package'19975,583,316'Heat-generating element cooling device'19965,504,650'Heat sink for cooling a heat producing element and application'1996D0357900'Combined heat sink and fan'1995D0356777'Combined heat sink and fan'1995Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
1995–2003Patents assigned to PFU LTD (15)· patent assignee history
1995–2000Patents assigned to FUJITSU LTD (6)· patent assignee history
1996–2003Based in Matsuda, JP· patent location history
1996–2000Based in Kahoku, JP· patent location history
1997–2009Patents assigned to KAO CORP (4)· patent assignee history
1998–2017Based in Ishikawa, JP· patent location history
2000–2015Based in Kanagawa, JP· patent location history
2013–2020Patents assigned to MURATA MANUFACTURING CO (8)· patent assignee history
2013–2015Patents assigned to KITAHARA TAKASHI (3)· patent assignee history
2017–2019Based in Kyoto, JP· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| PFU LTD | 15 | 1995–2003 |
| MURATA MANUFACTURING CO | 8 | 2013–2020 |
| FUJITSU LTD | 6 | 1995–2000 |
| KAO CORP | 4 | 1997–2009 |
| KITAHARA TAKASHIself | 3 | 2013–2015 |
Locations
| Location | Patents | Span |
|---|---|---|
| Matsuda, JP | 5 | 1996–2003 |
| Kahoku, JP | 5 | 1996–2000 |
| Kyoto, JP | 4 | 2017–2019 |
| Ishikawa, JP | 4 | 1998–2017 |
| Kanagawa, JP | 4 | 2000–2015 |