Inventor
Hiroshi Tomiyasu
Inventor
Tokyo, JP
Overview
Patents· 30 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G11Bprimary
G11BInformation storage based on relative movement between record carrier and transducer27%
Y10TTechnical subjects covered by former us classification14%
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices13%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests13%
B32BLayered products, i.e. products built-up of strata of flat or non-flat, e.g. cellular or honeycomb, form3%
B82YSpecific uses or applications of nanostructures3%
C01GCompounds containing metals not covered by subclasses c01d or c01f3%
C03CChemical composition of glasses, glazes or vitreous enamels3%
C22BProduction and refining of metals3%
G21CNuclear reactors3%
PatentTitleYear
8,257,783'Magnetic disk and method of manufacturing the same'20127,833,641'Magnetic disk'20107,420,886'Magnetic recording medium, and thermal stability measuring method and apparatus of magnetic recording medium'20087,220,446'Management technique of friction coefficient based on surface roughness, substrate for information recording medium, information recording medium and manufacture method thereof'20077,220,500'Magnetic recording medium, and thermal stability measuring method and apparatus of magnetic recording medium'20077,208,236'Magnetic recording medium with multi-portion carbon-based protection layer, and apparatus thereof'20076,946,191'Magnetic recording medium'20056,916,558'Magnetic disk using a glass substrate'20056,852,010'Substrate for an information recording medium, information recording medium using the substrate, and method of producing the substrate'20056,790,509'Substrate for information recording medium, information recording medium, and method for controlling surface of substrate for information recording medium'20046,759,138'Antiferromagnetically coupled magnetic recording medium with dual-layered upper magnetic layer'20046,706,427'Management technique of friction coefficient based on surface roughness, substrate for information recording medium, information recording medium and manufacture method thereof'20046,670,055'Magnetic recording medium and manufacturing method therefor'20036,537,648'Substrate for an information recording medium, information recording medium using the substrate and method of producing the substrate'20035,966,273'Magnetoresistive thin film head'19995,723,260'Unsaturated group-containing urethane compound, photopolymerizable composition containing it, and photosensitive lithographic printing plate'19985,677,101'Light-sensitive lithographic printing plate having a light sensitive layer comprising a clathrate compound'19975,678,167'Method for dissolving nuclear fuels'19975,585,043'Method of coextracting neptunium and plutonium'19965,513,056'Magnetic head slider'19965,500,192'Method of separating neptunium and plutonium'19965,260,167'Light-sensitive litho printing plate requiring no dampening water'19935,238,771'Lithographic printing plate utilizing aluminum substrate with photosensitive layer containing o-naphthoquinonediazide sulfonic acid ester, alkali soluble resin and select additive'19935,225,309'Light-sensitive litho printing plate with cured diazo primer layer, diazo resin/salt light-sensitive layer containing a coupler and silicone rubber overlayer'19935,219,700'Photosensitive composition containing 1,2-naphthoquinone-2-diazido-4-sulfonic acid ester, alkali-soluble resin, halomethyloxadiazole compound and a dye'19935,184,263'Loading method and drive unit for a floating magnetic head for loading the magnetic head while preventing contact between the magnetic head and a magnetic disk'19935,182,183'Positive photosensitive planographic printing plates containing specific high-molecular weight compound and photosensitive ester of O-napthoquinonediazidosulfonic acid with polyhydroxybenzophenone'19934,731,316'Photosensitive composition'19884,611,763'Method and apparatus for controlling a grinding mill'19864,440,029'Impact flow meter'1984Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
1988–1997Patents assigned to KONISHIROKU PHOTO IND (7)· patent assignee history
1988–1993Patents assigned to MITSUBISHI CHEM IND (6)· patent assignee history
1993–2008Based in Tokyo, JP· patent location history
1993Based in Tama, JP· patent location history
1993–1999Based in Kumamoto, JP· patent location history
1996–1997Patents assigned to DORYOKURO KAKUNENRYO (3)· patent assignee history
1996–1998Based in Yokohama, JP· patent location history
2003–2008Patents assigned to HOYA CORP (9)· patent assignee history
2004–2007Patents assigned to HOYA MAGNETICS SINGAPORE PTE (4)· patent assignee history
2004–2010Based in Shinjuku-ku, JP· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| HOYA CORP | 9 | 2003–2008 |
| KONISHIROKU PHOTO IND | 7 | 1988–1997 |
| MITSUBISHI CHEM IND | 6 | 1988–1993 |
| HOYA MAGNETICS SINGAPORE PTE | 4 | 2004–2007 |
| DORYOKURO KAKUNENRYO | 3 | 1996–1997 |
Locations
| Location | Patents | Span |
|---|---|---|
| Tokyo, JP | 12 | 1993–2008 |
| Yokohama, JP | 5 | 1996–1998 |
| Tama, JP | 4 | 1993 |
| Shinjuku-ku, JP | 2 | 2004–2010 |
| Kumamoto, JP | 2 | 1993–1999 |