Inventor
BART J. VAN SCHRAVENDIJK
Inventor
US
Overview
Patents· 19 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
H10Pprimary
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1024%
C23CCoating metallic material21%
H01LSemiconductor devices21%
H01JElectric discharge tubes or discharge lamps9%
H10DInorganic electric semiconductor devices9%
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h109%
H10BElectronic memory devices5%
H10KOrganic electric solid-state devices1%
H10NElectric solid-state devices not otherwise provided for1%
PatentTitleYear
12,598,930Conformal thermal CVD with controlled film properties and high deposition rate202612,451,346Modulated atomic layer deposition202512,417,943Reducing intralevel capacitance in semiconductor devices202512,412,742Impurity reduction in silicon-containing films202512,385,138Plasma-enhanced deposition of film stacks202512,341,002Low stress films for advanced semiconductor applications202512,261,038Gapfill of variable aspect ratio features with a composite PEALD and PECVD method202512,125,705Method for providing doped silicon using a diffusion barrier layer202412,112,980Method to create air gaps202412,087,573Modulation of oxidation profile for substrate processing202412,087,572Etch stop layer202412,080,592Film stack simplification for high aspect ratio patterning and vertical scaling202412,051,589Tin oxide thin film spacers in semiconductor device manufacturing202412,040,181Modulated atomic layer deposition202412,037,686Selective carbon deposition202411,920,239Minimizing radical recombination using ALD silicon oxide surface coating with intermittent restoration plasma202411,784,047Tin oxide thin film spacers in semiconductor device manufacturing202311,637,037Method to create air gaps202311,183,383Tin oxide thin film spacers in semiconductor device manufacturing2021Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2021–2025Patents assigned to LAM RES CORP (17)· patent assignee history
2021–2026Based in US· patent location history
2025Patents assigned to NOVELLUS SYSTEMS INC (1)· patent assignee history
2026Patents assigned to LAM RES CORPORATION (1)· patent assignee history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| LAM RES CORP | 17 | 2021–2025 |
| LAM RES CORPORATION | 1 | 2026 |
| NOVELLUS SYSTEMS INC | 1 | 2025 |
Locations
| Location | Patents | Span |
|---|---|---|
| US | 19 | 2021–2026 |