Inventor

David Wang

Inventor
Lexington, MA, US

Overview

9→
Patents
1991–2021
Patent span
Performing operations
Primary field (CPC B)

Patents· 9 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

B01Dprimary
B01DSeparation14%
G01NInvestigating or analysing materials by determining their chemical or physical properties14%
B01FMixing, e.g. dissolving, emulsifying or dispersing9%
C02FTreatment of water, waste water, sewage, or sludge9%
C11DDetergent compositions9%
H01HElectric switches9%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h109%
A61FFilters implantable into blood vessels5%
A61LMethods or apparatus for sterilising materials or objects in general5%
G05BControl or regulating systems in general5%

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

1991–1996Patents assigned to MILLIPORE CORP (3)· patent assignee history
1991–1996Based in Lexington, MA, US· patent location history
2018–2020Patents assigned to ACM RESEARCH SHANGHAI INC (2)· patent assignee history
2018–2020Patents assigned to NOMURA MICRO SCIENCE KK (2)· patent assignee history
2018–2020Based in Shanghai, CN· patent location history
2020Based in Rockville, MD, US· patent location history
2021Patents assigned to POLYTRONICS TECHNOLOGY CORP (2)· patent assignee history
2021Patents assigned to BEET INC (1)· patent assignee history
2021Based in Taipei, TW· patent location history
2021Based in Northville, MI, US· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
MILLIPORE CORP31991–1996
ACM RESEARCH SHANGHAI INC22018–2020
NOMURA MICRO SCIENCE KK22018–2020
POLYTRONICS TECHNOLOGY CORP22021
BEET INC12021
Locations
LocationPatentsSpan
Lexington, Massachusetts, US31991–1996
Taipei, TW22021
Shanghai, CN22018–2020
Northville, MI, US12021
Rockville, Maryland, US12020