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Inventor

Vladimir Mihailovitch Krivtsun

Inventor
Troitsk, RU

Overview

24→
Patents
2006–2016
Patent span
Physics
Primary field (CPC G)

Patents· 24 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices30%
H05GX-ray technique22%
B82YSpecific uses or applications of nanostructures8%
B08BCleaning in general5%
G01JMeasurement of intensity, velocity, spectral content, polarisation, phase or pulse characteristics of infrared, visible or ultraviolet light5%
G03BApparatus or arrangements for taking photographs or for projecting or viewing them5%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h105%
H05HPlasma technique4%
G01NInvestigating or analysing materials by determining their chemical or physical properties3%
G21KHandling of particles or ionising radiation not otherwise provided for3%
PatentTitleYear
9,411,238'Source-collector device, lithographic apparatus, and device manufacturing method'20169,411,250'Radiation system and lithographic apparatus'20169,366,967'Radiation source'20169,357,626'Photon source, metrology apparatus, lithographic system and device manufacturing method'20169,307,624'Lithographic apparatus'20169,261,784'Lithographic patterning process and resists to use therein'20169,007,565'Spectral purity filter'20158,921,814'Photon source, metrology apparatus, lithographic system and device manufacturing method'20148,755,032'Radiation source and lithographic apparatus'20148,598,550'Ex-situ removal of deposition on an optical element'20138,493,548'Lithographic apparatus and device manufacturing method'20138,294,128'Apparatus with plasma radiation source and method of forming a beam of radiation'20128,134,136'Ex-situ removal of deposition on an optical element'20127,872,244'Lithographic apparatus and device manufacturing method'20117,772,570'Assembly for blocking a beam of radiation and method of blocking a beam of radiation'20107,767,989'Ex-situ removal of deposition on an optical element'20107,696,492'Radiation system and lithographic apparatus'20107,557,366'Radiation generating device, lithographic apparatus, device manufacturing method and device manufactured thereby'20097,528,395'Radiation source, lithographic apparatus and device manufacturing method'20097,518,134'Plasma radiation source for a lithographic apparatus'20097,462,851'Electromagnetic radiation source, lithographic apparatus, device manufacturing method and device manufactured thereby'20087,372,058'Ex-situ removal of deposition on an optical element'20087,335,900'Radiation generating device, lithographic apparatus, device manufacturing method and device manufactured thereby'20087,061,574'Lithographic apparatus with contamination suppression, device manufacturing method, and device manufactured thereby'2006

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2006–2016Patents assigned to ASML NETHERLANDS BV (24)· patent assignee history
2006–2016Based in Troitsk, RU· patent location history
2008–2016Based in Moscow, RU· patent location history
2012–2016Patents assigned to KRIVTSUN VLADIMIR MIHAILOVITCH (10)· patent assignee history
2012–2016Patents assigned to BANINE VADIM YEVGENYEVICH (7)· patent assignee history
2012–2016Patents assigned to IVANOV VLADIMIR VITALEVICH (6)· patent assignee history
2014–2016Patents assigned to YAKUNIN ANDREI MIKHAILOVICH (4)· patent assignee history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
ASML NETHERLANDS BV242006–2016
KRIVTSUN VLADIMIR MIHAILOVITCHself102012–2016
BANINE VADIM YEVGENYEVICH72012–2016
IVANOV VLADIMIR VITALEVICH62012–2016
YAKUNIN ANDREI MIKHAILOVICH42014–2016
Locations
LocationPatentsSpan
Troitsk, RU172006–2016
Moscow, RU72008–2016