Inventor
Claude Montcalm
Inventor
Livermore, CA, US
Overview
Patents· 10 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G02Bprimary
G02BOptical elements, systems or apparatus31%
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices21%
Y10TTechnical subjects covered by former us classification14%
C23CCoating metallic material10%
B82YSpecific uses or applications of nanostructures7%
C03CChemical composition of glasses, glazes or vitreous enamels7%
G21KHandling of particles or ionising radiation not otherwise provided for7%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h103%
PatentTitleYear
6,844,272'Correction of localized shape errors on optical surfaces by altering the localized density of surface or near-surface layers'20056,668,207'Method and system using power modulation and velocity modulation producing sputtered thin films with sub-angstrom thickness uniformity or custom thickness gradients'20036,634,760'Low-cost method for producing extreme ultraviolet lithography optics'20036,524,449'Method and system for producing sputtered thin films with sub-angstrom thickness uniformity or custom thickness gradients'20036,425,988'Method and system using power modulation for maskless vapor deposition of spatially graded thin film and multilayer coatings with atomic-level precision and accuracy'20026,309,705'Process for fabricating high reflectance-low stress Mo--Si multilayer reflective coatings'20016,134,049'Method to adjust multilayer film stress induced deformation of optics'20006,110,607'High reflectance-low stress Mo-Si multilayer reflective coatings'20006,011,646'Method to adjust multilayer film stress induced deformation of optics'20005,958,605'Passivating overcoat bilayer for multilayer reflective coatings for extreme ultraviolet lithography'1999Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
1999–2003Patents assigned to UNIV CALIFORNIA (5)· patent assignee history
1999–2003Based in Livermore, CA, US· patent location history
2000Patents assigned to UNVIERSITY OF CALIFORNIA (1)· patent assignee history
2003Patents assigned to USA (1)· patent assignee history
2003–2005Based in Fort Collins, CO, US· patent location history
2005Patents assigned to EUV LLC (1)· patent assignee history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| UNIV CALIFORNIA | 5 | 1999–2003 |
| EUV LLC | 1 | 2005 |
| UNVIERSITY OF CALIFORNIA | 1 | 2000 |
| USA | 1 | 2003 |
Locations
| Location | Patents | Span |
|---|---|---|
| Livermore, California, US | 8 | 1999–2003 |
| Fort Collins, CO, US | 2 | 2003–2005 |