Inventor

Toshiei Kurosaki

Inventor

Hitachinaka, JP

Overview

30→

Patents

1977–2009

Patent span

Physics

Primary field (CPC G)

Patents· 30 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G03Fprimary

G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices32%

G01NInvestigating or analysing materials by determining their chemical or physical properties14%

H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1014%

H01JElectric discharge tubes or discharge lamps13%

G06TImage data processing or generation, in general11%

G01JMeasurement of intensity, velocity, spectral content, polarisation, phase or pulse characteristics of infrared, visible or ultraviolet light4%

B23KSoldering or unsoldering2%

B41MPrinting, duplicating, marking, or copying processes2%

F16HGearing2%

G01DMeasuring not specially adapted for a specific variable2%

PatentTitleYear

7,558,683'Method for inspecting defect and system therefor'2009 7,356,177'Defect image classifying method and apparatus and a semiconductor device manufacturing process based on the method and apparatus'2008 7,305,314'Method for inspecting defect and system therefor'2007 7,113,628'Defect image classifying method and apparatus and a semiconductor device manufacturing process based on the method and apparatus'2006 7,010,447'Method for inspecting defect and system therefor'2006 6,792,359'Method for inspecting defect and system therefor'2004 6,765,205'Electron microscope including apparatus for X-ray analysis and method of analyzing specimens using same'2004 6,553,323'Method and its apparatus for inspecting a specimen'2003 6,476,388'Scanning electron microscope having magnification switching control'2002 RE036731'Method of forming pattern and projection aligner for carrying out the same'2000 5,747,816'Charged particle beam apparatus'1998 5,392,115'Method of detecting inclination of a specimen and a projection exposure device as well as method of detecting period of periodically varying signal'1995 5,247,329'Projection type exposure method and apparatus'1993 5,235,400'Method of and apparatus for detecting defect on photomask'1993 5,078,495'Monochromator'1992 4,992,825'Method of forming pattern and projection aligner for carrying out the same'1991 4,983,039'Spectrometer'1991 4,904,569'Method of forming pattern and projection aligner for carrying out the same'1990 4,869,999'Method of forming pattern and projection aligner for carrying out the same'1989 4,857,744'Optical projection printing apparatus wherein wafer mark has a grating pitch in the sagittal plane of the first optical system'1989 4,798,470'Pattern printing method and apparatus'1989 4,614,432'Pattern detector'1986 4,597,669'Pattern detector'1986 4,504,726'Pattern generator'1985 4,480,910'Pattern forming apparatus'1984 4,477,183'Automatic focusing apparatus'1984 4,441,206'Pattern detecting apparatus'1984 4,380,395'Reduction projection aligner system'1983 4,317,383'Proportional linear output system'1982 4,057,347'Optical exposure apparatus'1977

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

1977–2009Patents assigned to HITACHI LTD (29)· patent assignee history

1977–1983Based in Kokubunji, JP· patent location history

1984–2008Based in Tokyo, JP· patent location history

1989–2000Based in Kodaira, JP· patent location history

1992–1995Based in Katsuta, JP· patent location history

1998–2009Based in Hitachinaka, JP· patent location history

2004Patents assigned to HITACHI HIGH TECH CORP (1)· patent assignee history

Inventor activity

Assignee and location history derived from the patent record.

Assignees

Assignee	Patents	Span
HITACHI LTD	29	1977–2009
HITACHI HIGH TECH CORP	1	2004

Locations

Location	Patents	Span
Hitachinaka, JP	9	1998–2009
Kodaira, JP	7	1989–2000
Tokyo, JP	5	1984–2008
Katsuta, JP	4	1992–1995
Kokubunji, JP	3	1977–1983