Inventor
Alfred K. Wong
Inventor
Brookline, MA, US
Overview
Patents· 32 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices51%
G06FElectric digital data processing15%
LOC128%
H03MCoding5%
B60RVehicles, vehicle fittings, or vehicle parts, not otherwise provided for3%
B82YSpecific uses or applications of nanostructures3%
G01NInvestigating or analysing materials by determining their chemical or physical properties3%
G02BOptical elements, systems or apparatus3%
G06TImage data processing or generation, in general3%
G10LSpeech analysis techniques or speech synthesis3%
PatentTitleYear
D0918105Vehicle front grille guard2021D0911225Chain stay2021D0908547Vehicle head tube20219,576,098'Lithography aware leakage analysis'20179,196,244'Methodology for enhanced voice search experience'20158,572,523'Lithography aware leakage analysis'20138,473,876'Lithography aware timing analysis'20137,932,020'Contact or proximity printing using a magnified mask image'20117,614,033'Mask data preparation'20097,569,308'Rectangular contact lithography for circuit performance improvement and manufacture cost reduction'20097,441,174'Embedded state metric storage for MAP decoder of turbo codes'20087,434,188'Lithographically optimized placement tool'20087,155,689'Design-manufacturing interface via a unified model'20067,055,127'Mask data preparation'20067,009,490'Efficient lock and key system'20066,961,186'Contact printing using a magnified mask image'20056,871,316'Delay reduction of hardware implementation of the maximum a posteriori (MAP) method'20056,602,728'Method for generating a proximity model based on proximity rules'20036,596,442'Asymmetric halftone biasing for sub-grid pattern adjustment'20036,578,190'Process window based optical proximity correction of lithographic images'20036,563,566'System and method for printing semiconductor patterns using an optimized illumination and reticle'20036,553,559'Method to determine optical proximity correction and assist feature rules which account for variations in mask dimensions'20036,541,166'Method and apparatus for lithographically printing tightly nested and isolated device features using multiple mask exposures'20036,526,164'Intelligent photomask disposition'20036,525,818'Overlay alignment system using polarization schemes'20036,511,791'Multiple exposure process for formation of dense rectangular arrays'20036,338,922'Optimized alternating phase shifted mask design'20026,327,033'Detection of phase defects on photomasks by differential imaging'20016,223,139'Kernel-based fast aerial image computation for a large scale design of integrated circuit patterns'20016,057,063'Phase shifted mask design system, phase shifted mask and VLSI circuit devices manufactured therewith'20005,965,306'Method of determining the printability of photomask defects'19995,932,377'Exact transmission balanced alternating phase-shifting mask for photolithography'1999Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
1999–2003Patents assigned to IBM (15)· patent assignee history
1999–2003Based in Beacon, NY, US· patent location history
2003–2005Based in Pokfulam, HK· patent location history
2005–2011Patents assigned to TAKUMI TECHNOLOGY CORP (4)· patent assignee history
2005–2017Based in Brookline, MA, US· patent location history
2006–2009Patents assigned to UNIV HONG KONG (3)· patent assignee history
2006–2009Based in Hong Kong, CN· patent location history
2013–2017Patents assigned to SYNOPSYS INC (3)· patent assignee history
2013Patents assigned to AJAMI AMIR (2)· patent assignee history
2021Based in Irvine, CA, US· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| IBM | 15 | 1999–2003 |
| TAKUMI TECHNOLOGY CORP | 4 | 2005–2011 |
| SYNOPSYS INC | 3 | 2013–2017 |
| UNIV HONG KONG | 3 | 2006–2009 |
| AJAMI AMIR | 2 | 2013 |
Locations
| Location | Patents | Span |
|---|---|---|
| Brookline, Massachusetts, US | 10 | 2005–2017 |
| Beacon, New York, US | 10 | 1999–2003 |
| Pokfulam, HK | 6 | 2003–2005 |
| Irvine, California, US | 3 | 2021 |
| Hong Kong, CN | 2 | 2006–2009 |