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Inventor

Nico Kemper

Inventor
Eindhoven, NL

Overview

1→
Patents
2010
Patent span
Physics
Primary field (CPC G)

Patents· 1 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G02Bprimary
G02BOptical elements, systems or apparatus50%
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices50%
PatentTitleYear
7,692,881'Structure for use in a projection exposure system for manufacturing semiconductors'2010

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2010Patents assigned to ASML NETHERLANDS BV (1)· patent assignee history
2010Patents assigned to ZEISS CARL SMT AG (1)· patent assignee history
2010Based in Eindhoven, NL· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
ASML NETHERLANDS BV12010
ZEISS CARL SMT AG12010
Locations
LocationPatentsSpan
Eindhoven, NL12010