Inventor
Lawrence Ferreira
Inventor
Fall River, MA, US
Overview
Patents· 16 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices30%
C07CAcyclic or carbocyclic compounds15%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests15%
C07DHeterocyclic compounds13%
C08FMacromolecular compounds obtained by reactions only involving carbon-to-carbon unsaturated bonds13%
C08LCompositions of macromolecular compounds5%
B01DSeparation3%
B01JChemical or physical processes, e.g. catalysis or colloid chemistry3%
C11DDetergent compositions3%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h103%
PatentTitleYear
7,935,665'Non-corrosive cleaning compositions for removing etch residues'20116,855,476'Photoacid generators for use in photoresist compositions'20056,380,317'Production of acetal derivatized hydroxyl aromatic polymers and their use in radiation sensitive formulations'20026,312,870't-butyl cinnamate polymers and their use in photoresist compositions'20016,309,793'Production of acetal derivatized hydroxyl aromatic polymers and their use in radiation sensitive formulations'20016,200,480'Method of purifying photoacid generators for use in photoresist compositions'20016,159,653'Production of acetal derivatized hydroxyl aromatic polymers and their use in radiation sensitive formulations'20006,140,026'Photosensitive diazonaphthoquinone esters based on selected cyclic alkyl ether-containing phenolics and their use in radiation sensitive mixtures'20006,133,412'Production of acetal derivatized hydroxyl aromatic polymers and their use in radiation sensitive formulations'20006,040,107'Photosensitive diazonaphthoquinone esters based on selected cyclic alkyl ether-containing phenolics and their use in radiation sensitive mixtures'20005,602,260'Selected O-quinonediazide sulfonic acid esters of phenolic compounds and their use in radiation-sensitive compositions'19975,547,814'O-quinonediazide sulfonic acid esters of phenolic compounds and their use in forming positive images'19965,541,033'Selected o-quinonediazide sulfonic acid esters of phenolic compounds and their use in radiation-sensitive compositions'19965,446,125'Method for removing metal impurities from resist components'19955,234,789'Polylactide compounds as sensitivity enhancers for radiation sensitive mixtures containing o-quinonediazide photoactive compounds'19934,711,836'Development of positive-working photoresist compositions'1987Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
1987Patents assigned to OLIN HUNT SPECIALTY PROD (1)· patent assignee history
1987–2011Based in Fall River, MA, US· patent location history
1993–1997Patents assigned to OCG MICROELECTRONIC MATERIALS (5)· patent assignee history
2000–2005Patents assigned to ARCH SPEC CHEM INC (7)· patent assignee history
2000Patents assigned to ARCH CHEM INC (1)· patent assignee history
2011Patents assigned to FUJIFILM ELECTRONIC MATERIALS (1)· patent assignee history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| ARCH SPEC CHEM INC | 7 | 2000–2005 |
| OCG MICROELECTRONIC MATERIALS | 5 | 1993–1997 |
| ARCH CHEM INC | 1 | 2000 |
| FUJIFILM ELECTRONIC MATERIALS | 1 | 2011 |
| OLIN HUNT SPECIALTY PROD | 1 | 1987 |
Locations
| Location | Patents | Span |
|---|---|---|
| Fall River, Massachusetts, US | 16 | 1987–2011 |