Inventor
Ryuji Kitakado
Inventor
Kyoto, JP
Overview
Patents· 21 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
H10Pprimary
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1022%
G06TImage data processing or generation, in general18%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests16%
B08BCleaning in general12%
G01NInvestigating or analysing materials by determining their chemical or physical properties8%
G01RMeasuring electric variables6%
G06VImage or video recognition or understanding6%
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices4%
H05KPrinted circuits4%
C03CChemical composition of glasses, glazes or vitreous enamels2%
PatentTitleYear
7,252,719'High pressure processing method'20077,111,630'High pressure processing apparatus and method'20067,080,651'High pressure processing apparatus and method'20067,000,653'High pressure processing apparatus and high pressure processing method'20066,874,513'High pressure processing apparatus'20056,841,031'Substrate processing apparatus equipping with high-pressure processing unit'20056,823,880'High pressure processing apparatus and high pressure processing method'20046,703,316'Method and system for processing substrate'20046,691,430'High-pressure drying apparatus, high-pressure drying method and substrate processing apparatus'20046,099,643'Apparatus for processing a substrate providing an efficient arrangement and atmospheric isolation of chemical treatment section'20005,963,753'Substrate processing apparatus'19995,408,538'Method of and apparatus for inspecting the minimum annular width of a land on a printed circuit board'19955,398,291'Method and apparatus for detecting neck disconnection between land and line of wiring pattern on printed board'19955,315,409'Method of and apparatus for obtaining binary image'19945,161,202'Method of and device for inspecting pattern of printed circuit board'19925,150,422'Method of and apparatus for inspecting conductive pattern on printed board'19925,144,132'Method of and device for compensating for reading-position error of image sensor'19925,144,681'Method of and apparatus for inspecting conductive pattern on printed board'19925,027,417'Method of and apparatus for inspecting conductive pattern on printed board'19914,803,734'Method of and apparatus for detecting pattern defects'19894,797,939'Pattern masking method and an apparatus therefor'1989Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
1989–2007Patents assigned to DAINIPPON SCREEN MFG (18)· patent assignee history
1989–2007Based in Kyoto, JP· patent location history
1992Patents assigned to DAINNIPPON SCREEN MFG CO LTD (1)· patent assignee history
1992–1995Based in Tenjinkitamachi, JP· patent location history
2004–2006Patents assigned to KOBE STEEL LTD (5)· patent assignee history
2006Based in Saitama-shi, JP· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| DAINIPPON SCREEN MFG | 18 | 1989–2007 |
| KOBE STEEL LTD | 5 | 2004–2006 |
| DAINNIPPON SCREEN MFG CO LTD | 1 | 1992 |
Locations
| Location | Patents | Span |
|---|---|---|
| Kyoto, JP | 18 | 1989–2007 |
| Tenjinkitamachi, JP | 2 | 1992–1995 |
| Saitama-shi, JP | 1 | 2006 |