Inventor
Yoshimi Watabe
Inventor
Tokyo, JP
Overview
Patents· 9 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
H01Jprimary
H01JElectric discharge tubes or discharge lamps19%
C23CCoating metallic material16%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1016%
Y02PClimate change mitigation technologies in the production or processing of goods10%
B23KSoldering or unsoldering6%
H10DInorganic electric semiconductor devices6%
Y02CCapture, storage, sequestration or disposal of greenhouse gases [ghg]6%
Y02EReduction of greenhouse gas [ghg] emissions, related to energy generation, transmission or distribution6%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests6%
F28DHeat-exchange apparatus, not provided for in another subclass, in which the heat-exchange media do not come into direct contact3%
PatentTitleYear
8,002,947'Plasma treatment system and cleaning method of the same'20117,913,752'Cooling device for vacuum treatment device'20117,530,359'Plasma treatment system and cleaning method of the same'20097,312,418'Semiconductor thin film forming system'20076,861,614'S system for the formation of a silicon thin film and a semiconductor-insulating film interface'20056,664,496'Plasma processing system'20036,503,816'Thin film formation by inductively-coupled plasma CVD process'20036,189,485'Plasma CVD apparatus suitable for manufacturing solar cell and the like'20015,437,895'Plasma CVD process for forming amorphous silicon thin film'1995Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
1995–2007Patents assigned to ANELVA CORP (6)· patent assignee history
1995–2007Based in Tokyo, JP· patent location history
2001–2003Based in Kunitachi, JP· patent location history
2005–2007Patents assigned to NEC CORP (2)· patent assignee history
2009–2011Patents assigned to HITACHI INT ELECTRIC INC (2)· patent assignee history
2009–2011Patents assigned to KANTO DENKA KOGYO KK (2)· patent assignee history
2009–2011Patents assigned to SANYO ELECTRIC CO (2)· patent assignee history
2009–2011Based in Yokohama, JP· patent location history
2011Based in Kanagawa, JP· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| ANELVA CORP | 6 | 1995–2007 |
| HITACHI INT ELECTRIC INC | 2 | 2009–2011 |
| KANTO DENKA KOGYO KK | 2 | 2009–2011 |
| NEC CORP | 2 | 2005–2007 |
| SANYO ELECTRIC CO | 2 | 2009–2011 |
Locations
| Location | Patents | Span |
|---|---|---|
| Tokyo, JP | 3 | 1995–2007 |
| Kunitachi, JP | 3 | 2001–2003 |
| Yokohama, JP | 2 | 2009–2011 |
| Kanagawa, JP | 1 | 2011 |