Inventor
Nadav GUTMAN
Inventor
IL
Overview
Patents· 15 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices30%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1013%
G01BMeasuring length, thickness or similar linear dimensions11%
G06TImage data processing or generation, in general9%
G01NInvestigating or analysing materials by determining their chemical or physical properties6%
H01LSemiconductor devices6%
G02BOptical elements, systems or apparatus4%
H01JElectric discharge tubes or discharge lamps4%
H04NPictorial communication, e.g. television4%
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h104%
PatentTitleYear
12,535,744Overlay estimation based on optical inspection and machine learning202612,423,803Predicting tool induced shift using Moire overlay targets202512,100,574Target and algorithm to measure overlay by modeling back scattering electrons on overlapping structures202412,092,966Device feature specific edge placement error (EPE)202412,055,859Overlay mark design for electron beam overlay202412,001,148Enhancing performance of overlay metrology202411,862,524Overlay mark design for electron beam overlay202411,720,031Overlay design for electron beam and scatterometry overlay measurements202311,703,767Overlay mark design for electron beam overlay202311,698,251Methods and systems for overlay measurement based on soft X-ray Scatterometry202311,637,030Multi-stage, multi-zone substrate positioning systems202311,592,755Enhancing performance of overlay metrology202311,409,205Non-orthogonal target and method for using the same in measuring misregistration of semiconductor devices202211,353,321Metrology system and method for measuring diagonal diffraction-based overlay targets202211,209,737Performance optimized scanning sequence for eBeam metrology and inspection2021Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2021–2026Patents assigned to KLA CORP (15)· patent assignee history
2021–2026Based in IL· patent location history
2025Patents assigned to KLA Con (1)· patent assignee history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| KLA CORP | 15 | 2021–2026 |
| KLA Con | 1 | 2025 |
Locations
| Location | Patents | Span |
|---|---|---|
| IL | 15 | 2021–2026 |