Inventor
Shinji Kumada
Inventor
Kawasaki, JP
Overview
Patents· 5 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices40%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1020%
C07CAcyclic or carbocyclic compounds10%
C07DHeterocyclic compounds10%
C09KMaterials for miscellaneous applications, not provided for elsewhere10%
H01LSemiconductor devices10%
PatentTitleYear
10,961,422Surface treatment liquid, surface treatment method, and method for suppressing pattern collapse202110,353,291Method for forming photosensitive resin layer, method for producing photoresist pattern, and method for producing plated molded article20199,164,381'Resist composition, method of forming resist pattern, and compound'20159,012,125'Resist composition and method of forming resist pattern'20158,338,075'Positive resist composition and method of forming resist pattern'2012Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2012–2021Patents assigned to TOKYO OHKA KOGYO CO LTD (5)· patent assignee history
2012–2015Patents assigned to KUMADA SHINJI (2)· patent assignee history
2012Patents assigned to IWAI TAKESHI (1)· patent assignee history
2012–2021Based in Kawasaki, JP· patent location history
2015Patents assigned to ARAI MASATOSHI (1)· patent assignee history
2015Patents assigned to MAEMORI SATOSHI (1)· patent assignee history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| TOKYO OHKA KOGYO CO LTD | 5 | 2012–2021 |
| KUMADA SHINJIself | 2 | 2012–2015 |
| ARAI MASATOSHI | 1 | 2015 |
| IWAI TAKESHI | 1 | 2012 |
| MAEMORI SATOSHI | 1 | 2015 |
Locations
| Location | Patents | Span |
|---|---|---|
| Kawasaki, JP | 5 | 2012–2021 |