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Inventor

Ulrich Naeher

Inventor
Munich, DE

Overview

3→
Patents
1997–1999
Patent span
Electricity
Primary field (CPC H)

Patents· 3 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

H10Pprimary
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1033%
B81CProcesses or apparatus specially adapted for the manufacture or treatment of microstructural devices or systems17%
C23FNon-mechanical removal of metallic material from surface17%
G01PMeasuring linear or angular speed, acceleration, deceleration, or shock17%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests17%
PatentTitleYear
5,877,421'Acceleration sensor'19995,698,112'Corrosion protection for micromechanical metal layers'19975,662,772'Method for the selective removal of silicon dioxide'1997

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

1997–1999Patents assigned to SIEMENS AG (3)· patent assignee history
1997–1999Based in Munich, DE· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
SIEMENS AG31997–1999
Locations
LocationPatentsSpan
Munich, DE31997–1999