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Inventor

Jingchao Qi

Inventor
Shanghai, CN

Overview

2→
Patents
2019
Patent span
Physics
Primary field (CPC G)

Patents· 2 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices40%
G01BMeasuring length, thickness or similar linear dimensions20%
H01LSemiconductor devices20%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1020%
PatentTitleYear
10,274,840Adaptive groove focusing and leveling device and method201910,197,923Exposure device and out-of-focus and tilt error compensation method2019

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2019Patents assigned to SHANGHAI MICRO ELECTRONICS EQUIPMENT GROUP CO LTD (2)· patent assignee history
2019Patents assigned to SHANGHAI MICROELECTRONICS EQUI (1)· patent assignee history
2019Based in Shanghai, CN· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
SHANGHAI MICRO ELECTRONICS EQUIPMENT GROUP CO LTD22019
SHANGHAI MICROELECTRONICS EQUI12019
Locations
LocationPatentsSpan
Shanghai, CN22019