Inventor
Bang-Chein Ho
Inventor
Hsinchu, TW
Overview
Patents· 18 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices29%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1020%
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h1017%
C08FMacromolecular compounds obtained by reactions only involving carbon-to-carbon unsaturated bonds11%
C09DCoating compositions, e.g. paints, varnishes or lacquers6%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests6%
B29CShaping or joining of plastics3%
B29DProducing particular articles from plastics or from substances in a plastic state3%
C08GMacromolecular compounds obtained otherwise than by reactions only involving unsaturated carbon-to-carbon bonds3%
G02BOptical elements, systems or apparatus3%
PatentTitleYear
8,101,340'Method of inhibiting photoresist pattern collapse'20127,972,957'Method of making openings in a layer of a semiconductor device'20117,749,904'Method of forming a dual damascene structure'20107,419,771'Method for forming a finely patterned resist'20087,341,939'Method for patterning micro features by using developable bottom anti-reflection coating'20087,241,682'Method of forming a dual damascene structure'20077,235,348'Water soluble negative tone photoresist'20077,094,686'Contact hole printing by packing and unpacking'20066,998,198'Contact hole printing by packing and unpacking'20066,905,621'Method for preventing the etch transfer of sidelobes in contact hole patterns'20056,900,134'Method for forming openings in a substrate using bottom antireflective coatings'20056,664,011'Hole printing by packing and unpacking using alternating phase-shifting masks'20036,538,086'Polymer with a pericyclic protective group and resist composition containing the same'20036,488,509'Plug filling for dual-damascene process'20026,303,725'Cyclic dione polymer'20016,207,779'Ring-opened polymer'20016,197,476'Photosensitive composition containing a cyclic dione polymer'20015,555,525'Method of making graded refractive index polymeric optical fibers and optical fibers made by the method'1996Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
1996–2003Patents assigned to IND TECH RES INST (4)· patent assignee history
1996–2011Based in Hsinchu, TW· patent location history
2001–2003Patents assigned to EVERLIGHT CHEM IND CORP (3)· patent assignee history
2002–2012Patents assigned to TAIWAN SEMICONDUCTOR MFG (11)· patent assignee history
2007Patents assigned to AZ ELECTRONIC MATERIALS JAPAN (1)· patent assignee history
2012Patents assigned to CHANG CHING-YU (1)· patent assignee history
2012Based in Hsinchu County, TW· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| TAIWAN SEMICONDUCTOR MFG | 11 | 2002–2012 |
| IND TECH RES INST | 4 | 1996–2003 |
| EVERLIGHT CHEM IND CORP | 3 | 2001–2003 |
| AZ ELECTRONIC MATERIALS JAPAN | 1 | 2007 |
| CHANG CHING-YU | 1 | 2012 |
Locations
| Location | Patents | Span |
|---|---|---|
| Hsinchu, TW | 17 | 1996–2011 |
| Hsinchu County, TW | 1 | 2012 |