Inventor
MICHAEL X. YANG
Inventor
US
Overview
Patents· 28 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
H10Pprimary
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1030%
H01LSemiconductor devices27%
H01JElectric discharge tubes or discharge lamps16%
C23CCoating metallic material6%
H05HPlasma technique3%
B23KSoldering or unsoldering2%
G02FOptical devices or arrangements for the control of light by modification of the optical properties of the media of the elements involved therein2%
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices2%
G05BControl or regulating systems in general2%
H05BElectric heating2%
PatentTitleYear
12,399,064Systems and methods for thermal processing and temperature measurement of a workpiece at low temperatures202512,174,616Control system for adaptive control of a thermal processing system202412,119,216Arc lamp with forming gas for thermal processing systems202412,080,568Support plate for localized heating in thermal processing systems202412,014,920Apparatus for hydrogen assisted atmospheric radical oxidation202411,812,523Thermal processing system with transmission switch plate202311,791,181Methods for the treatment of workpieces202311,791,166Selective etch process using hydrofluoric acid and ozone gases202311,764,072Method for processing a workpiece using a multi-cycle thermal treatment process202311,721,539Arc lamp with forming gas for thermal processing systems202311,699,603Thermal processing system with temperature non-uniformity control202311,644,817Control system for adaptive control of a thermal processing system202311,586,113Methods and apparatus for post exposure bake processing of a workpiece202311,521,847Hydrogen assisted atmospheric radical oxidation202211,521,868Support plate for localized heating in thermal processing systems202211,495,456Ozone for selective hydrophilic surface treatment202211,495,437Surface pretreatment process to improve quality of oxide films produced by remote plasma202211,462,413Processing of workpieces using deposition process and etch process202211,387,111Processing of workpieces with reactive species generated using alkyl halide202211,387,115Silicon mandrel etch after native oxide punch-through202211,315,801Processing of workpieces using ozone gas and hydrogen radicals202211,289,323Processing of semiconductors using vaporized solvents202211,276,560Spacer etching process202211,195,718Spacer open process by dual plasma202111,183,397Selective etch process using hydrofluoric acid and ozone gases202111,164,725Generation of hydrogen reactive species for processing of workpieces202111,164,727Processing of workpieces using hydrogen radicals and ozone gas202111,164,742Selective deposition using methylation treatment2021Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2021–2025Patents assigned to BEIJING E TOWN SEMICONDUCTOR TECH CO LTD (28)· patent assignee history
2021–2025Patents assigned to MATTSON TECH INC (28)· patent assignee history
2021–2025Based in US· patent location history
2022Patents assigned to BEIJING E TOWN SEMICONDUCTOR CO LTD (1)· patent assignee history
2022Patents assigned to MATTSON TECH IN (1)· patent assignee history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| BEIJING E TOWN SEMICONDUCTOR TECH CO LTD | 28 | 2021–2025 |
| MATTSON TECH INC | 28 | 2021–2025 |
| BEIJING E TOWN SEMICONDUCTOR CO LTD | 1 | 2022 |
| MATTSON TECH IN | 1 | 2022 |
Locations
| Location | Patents | Span |
|---|---|---|
| US | 28 | 2021–2025 |