Inventor
Henricus Johannes Lambertus Megens
Inventor
Waalre, NL
Overview
Patents· 15 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices56%
G01NInvestigating or analysing materials by determining their chemical or physical properties15%
G01BMeasuring length, thickness or similar linear dimensions11%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1011%
G03BApparatus or arrangements for taking photographs or for projecting or viewing them4%
G06FElectric digital data processing4%
PatentTitleYear
11,079,684Measurement apparatus and a method for determining a substrate grid202111,029,610Lithographic method202111,016,397Source separation from metrology data202110,962,887Lithographic method202110,527,958Lithographic method202010,180,628Method of determining critical-dimension-related properties, inspection apparatus and device manufacturing method20199,696,635'Method of controlling a lithographic apparatus, device manufacturing method, lithographic apparatus, computer program product and method of improving a mathematical model of a lithographic process'20179,518,936'Method and apparatus for determining lithographic quality of a structure'20169,081,303'Methods and scatterometers, lithographic systems, and lithographic processing cells'20158,994,944'Methods and scatterometers, lithographic systems, and lithographic processing cells'20158,982,328'Method and apparatus for overlay measurement'20158,706,442'Alignment system, lithographic system and method'20148,502,955'Method of determining a characteristic'20138,390,823'Method, inspection apparatus and substrate for determining an approximate structure of an object on a substrate'20137,468,795'Method of selecting a grid model for correcting a process recipe for grid deformations in a lithographic apparatus and lithographic assembly using the same'2008Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2008–2021Patents assigned to ASML NETHERLANDS BV (15)· patent assignee history
2008–2021Based in Waalre, NL· patent location history
2013–2017Patents assigned to MEGENS HENRICUS JOHANNES LAMBERTUS (6)· patent assignee history
2013–2015Patents assigned to CRAMER HUGO AUGUSTINUS JOSEPH (2)· patent assignee history
2013–2015Patents assigned to LEEWIS CHRISTIAN MARINUS (2)· patent assignee history
2013–2015Patents assigned to QUAEDACKERS JOHANNES ANNA (2)· patent assignee history
2016Based in Veldhoven, NL· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| ASML NETHERLANDS BV | 15 | 2008–2021 |
| MEGENS HENRICUS JOHANNES LAMBERTUSself | 6 | 2013–2017 |
| CRAMER HUGO AUGUSTINUS JOSEPH | 2 | 2013–2015 |
| LEEWIS CHRISTIAN MARINUS | 2 | 2013–2015 |
| QUAEDACKERS JOHANNES ANNA | 2 | 2013–2015 |
Locations
| Location | Patents | Span |
|---|---|---|
| Waalre, NL | 14 | 2008–2021 |
| Veldhoven, NL | 1 | 2016 |