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Inventor

Satoshi Hanajima

Inventor
Tokyo, JP

Overview

4→
Patents
2009–2021
Patent span
Performing operations
Primary field (CPC B)

Patents· 4 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

H01Lprimary
H01LSemiconductor devices15%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1015%
B24BMachines, devices, or processes for grinding or polishing10%
B26FPerforating10%
B08BCleaning in general5%
B23KSoldering or unsoldering5%
B24CAbrasive or related blasting with particulate material5%
B26DCutting5%
B28DWorking stone or stone-like materials5%
G01BMeasuring length, thickness or similar linear dimensions5%
PatentTitleYear
10,964,555Water jet processing apparatus202110,665,508Cutting apparatus and groove detecting method202010,211,081Processing method of workpiece20197,585,201'Water jet processing method'2009

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2009–2021Patents assigned to DISCO CORP (4)· patent assignee history
2009Based in Ota, JP· patent location history
2019–2021Based in Tokyo, JP· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
DISCO CORP42009–2021
Locations
LocationPatentsSpan
Tokyo, JP32019–2021
Ota, JP12009